Have a personal or library account? Click to login
Far Field Measurements of Phc Led Prepared by E–Beam Lithography Cover

Far Field Measurements of Phc Led Prepared by E–Beam Lithography

Journal of Electrical Engineering
Volume 65 (2014): Issue 5 (September 2014)
By: Pavol Hronec,  Jaroslava Škriniarová,  Anna Benčurová,  Pavol Nemec,  Dušan Pudiš and  Jaroslav Kováč  
Open Access
|Nov 2014

Metrics

DOI: https://doi.org/10.2478/jee-2014-0050 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
Journal RSS Feed
Language: English
Page range: 309 - 312
Submitted on: Jul 15, 2014
|
Published on: Nov 5, 2014
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
LED,
Electron beam direct write lithography,
photonic crystal,
far field,
light extraction
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2014 Pavol Hronec, Jaroslava Škriniarová, Anna Benčurová, Pavol Nemec, Dušan Pudiš, Jaroslav Kováč, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Previous articleVolume 65 (2014): Issue 5 (September 2014)Next article