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Far Field Measurements of Phc Led Prepared by E–Beam Lithography Cover

Far Field Measurements of Phc Led Prepared by E–Beam Lithography

Journal of Electrical Engineering
Volume 65 (2014): Issue 5 (September 2014)
By: Pavol Hronec,  Jaroslava Škriniarová,  Anna Benčurová,  Pavol Nemec,  Dušan Pudiš and  Jaroslav Kováč  
Open Access
|Nov 2014

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DOI: https://doi.org/10.2478/jee-2014-0050 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
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Language: English
Page range: 309 - 312
Submitted on: Jul 15, 2014
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Published on: Nov 5, 2014
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
LED,
Electron beam direct write lithography,
photonic crystal,
far field,
light extraction
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2014 Pavol Hronec, Jaroslava Škriniarová, Anna Benčurová, Pavol Nemec, Dušan Pudiš, Jaroslav Kováč, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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