Have a personal or library account? Click to login
Low-temperature plasma applications in chemical fungicide treatment reduction Cover

Low-temperature plasma applications in chemical fungicide treatment reduction

Open Access
|Jun 2020

Abstract

In order to reduce the environmental burden of chemicals, various new alternatives to seed protection are being sought. Our aim was to find an environmentally acceptable solution leading to the inactivation of seed-borne phytopathogenic fungi Fusarium culmorum on the surface of wheat and barley seeds with a positive effect on their germination. As a low-temperature plasma (LTP) source, a Diffuse Coplanar Surface Barrier Discharge (DCSBD) was used. Plasma generated by DCSBD is non-equilibrium, cold, diffuse, macroscopically homogeneous even in ambient air at atmospheric pressure. Experimental results showed that LTP treatment in the range of 120—300 s significantly inhibits the growth of F. culmorum on the surface of the seeds. The efficiency of LTP treatment was compared with traditional seed protection processes using chemical fungicide and also with combined seed pretreatment by plasma and subsequent application of chemical fungicide. No growth of F. culmorum was observed after the combination of Vitavax 2000 fungicide application in the dose of 10 % and 60 s of LTP treatment even on the 5th day of incubation. Better wettability of seeds with the chemical fungicide was related to the change on seed surface, which becomes hydrophilic after 10 s of LTP application. Short LTP exposure times did not affect germination and improved the growth parameter of cereal seeds. By combining physical (LTP) and chemical (Vitavax 2000) treatments of cereal seeds, it is possible to effectively reduce the required amount of chemical fungicide and to stimulate germination and early growth seed parameters.

DOI: https://doi.org/10.2478/acs-2020-0005 | Journal eISSN: 1339-3065 | Journal ISSN: 1337-978X
Language: English
Page range: 26 - 33
Published on: Jun 29, 2020
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 2 times per year
Related subjects:

© 2020 Lucia Hoppanová, Veronika Medvecká, Juliana Dylíková, Daniela Hudecová, Barbora Kaliňáková, Svetlana Kryštofová, Anna Zahoranová, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution 4.0 License.