Annealing Effect on the Structural and Optical properties of SiOx films deposited by HFCVD: Features for its possible use as Optical Sensor
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DOI: https://doi.org/10.21307/ijssis-2019-122 | Journal eISSN: 1178-5608
Language: English
Page range: 1 - 6
Published on: Feb 15, 2020
Published by: Professor Subhas Chandra Mukhopadhyay
In partnership with: Paradigm Publishing Services
Publication frequency: 1 issue per year
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© 2020 J. A. Luna López, A. Benítez Lara, G. García Salgado, D. Hernández de la Luz, M. Pacio, A. Morales Sanchez, S. A. Perez Garcia, published by Professor Subhas Chandra Mukhopadhyay
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