Annealing Effect on the Structural and Optical properties of SiOx films deposited by HFCVD: Features for its possible use as Optical Sensor
Authors
J. A. Luna López
Science Institute-ICUAP-CIDS-BUAP Puebla, Pue., 72571, México
A. Benítez Lara
Science Institute-ICUAP-CIDS-BUAP Puebla, Pue., 72571, México
G. García Salgado
Science Institute-ICUAP-CIDS-BUAP Puebla, Pue., 72571, México
D. Hernández de la Luz
Science Institute-ICUAP-CIDS-BUAP Puebla, Pue., 72571, México
M. Pacio
Science Institute-ICUAP-CIDS-BUAP Puebla, Pue., 72571, México
A. Morales Sanchez
Centro de Investigación en Materiales Avanzados S. C, CIMAV-Unidad Monterrey-PIIT, Apodaca, Nuevo León, México
S. A. Perez Garcia
Centro de Investigación en Materiales Avanzados S. C, CIMAV-Unidad Monterrey-PIIT, Apodaca, Nuevo León, México
DOI: https://doi.org/10.21307/ijssis-2019-122 | Journal eISSN: 1178-5608
Language: English
Page range: 1 - 6
Published online: Feb 15, 2020
Published in print: Jan 1, 2014
Published by: International Journal on Smart Sensing and Intelligent Systems
In partnership with: Paradigm Publishing Services
Publication frequency: Volume open
Keywords:
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© 2020 J. A. Luna López, A. Benítez Lara, G. García Salgado, D. Hernández de la Luz, M. Pacio, A. Morales Sanchez, S. A. Perez Garcia, published by International Journal on Smart Sensing and Intelligent Systems
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.