Annealing Effect on the Structural and Optical properties of SiOx films deposited by HFCVD: Features for its possible use as Optical Sensor
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Authors
J. A. Luna López
Science Institute-ICUAP-CIDS-BUAP Puebla, Pue., 72571, México
A. Benítez Lara
Science Institute-ICUAP-CIDS-BUAP Puebla, Pue., 72571, México
G. García Salgado
Science Institute-ICUAP-CIDS-BUAP Puebla, Pue., 72571, México
D. Hernández de la Luz
Science Institute-ICUAP-CIDS-BUAP Puebla, Pue., 72571, México
M. Pacio
Science Institute-ICUAP-CIDS-BUAP Puebla, Pue., 72571, México
A. Morales Sanchez
Centro de Investigación en Materiales Avanzados S. C, CIMAV-Unidad Monterrey-PIIT, Apodaca, Nuevo León, México
S. A. Perez Garcia
Centro de Investigación en Materiales Avanzados S. C, CIMAV-Unidad Monterrey-PIIT, Apodaca, Nuevo León, México
DOI: https://doi.org/10.21307/ijssis-2019-122 | Journal eISSN: 1178-5608
Language: English
Page range: 1 - 6
Published on: Feb 15, 2020
Published by: Professor Subhas Chandra Mukhopadhyay
In partnership with: Paradigm Publishing Services
Publication frequency: 1 issue per year
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© 2020 J. A. Luna López, A. Benítez Lara, G. García Salgado, D. Hernández de la Luz, M. Pacio, A. Morales Sanchez, S. A. Perez Garcia, published by Professor Subhas Chandra Mukhopadhyay
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.