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Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films
[12] OLESZKIEWICZ W., KIJASZEK W., GRYGLEWICZ J., ZAKRZEWSKI A., GAJEWSKI K., KOPIEC D., KAMYCZEK P., POPKO E., TŁACZAŁA M., Proc. SPIE, 8902 (2013), 89022H.