Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films
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Language: English
Page range: 80 - 85
Submitted on: Apr 3, 2017
Accepted on: Jan 24, 2018
Published on: May 18, 2018
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
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© 2018 Wojciech Kijaszek, Waldemar Oleszkiewicz, Zbigniew Znamirowski, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.