Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films Cover

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Application of radio frequency inductively coupled plasma in chemical vapor deposition process of diamond-like carbon films for modification of properties of deposited films

Materials Science-Poland

Volume 36 (2018): Issue 1 (March 2018)

By: Wojciech Kijaszek, Waldemar Oleszkiewicz and Zbigniew Znamirowski

Open Access

|May 2018

Authors

Wojciech Kijaszek

wojciech.kijaszek@pwr.edu.pl

Faculty of Microsystem Electronics and Photonics, Wrocław University of Science and Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland

Waldemar Oleszkiewicz

Faculty of Microsystem Electronics and Photonics, Wrocław University of Science and Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland

Zbigniew Znamirowski

Faculty of Microsystem Electronics and Photonics, Wrocław University of Science and Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland

DOI: https://doi.org/10.1515/msp-2017-0119 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331

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Language: English

Page range: 80 - 85

Submitted on: Apr 3, 2017

|

Accepted on: Jan 24, 2018

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Published on: May 18, 2018

Published by: Wroclaw University of Science and Technology

In partnership with: Paradigm Publishing Services

Publication frequency: 4 issues per year

Keywords:

diamond-like carbon,

Raman scattering spectroscopy,

Related subjects:

Materials sciences,

Materials sciences, other,

Functional and smart materials,

Materials characterization and properties

© 2018 Wojciech Kijaszek, Waldemar Oleszkiewicz, Zbigniew Znamirowski, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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