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Etching and ellipsometry studies on CL-VPE grown GaN epilayer Cover

Etching and ellipsometry studies on CL-VPE grown GaN epilayer

By: P. Puviarasu  
Open Access
|Feb 2017
DOI: https://doi.org/10.1515/msp-2017-0023 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 135 - 139
Submitted on: May 6, 2015
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Accepted on: Jan 5, 2017
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Published on: Feb 24, 2017
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2017 P. Puviarasu, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.