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Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application Cover

Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application

By: S. Venkatesan and  M. Ramu  
Open Access
|Nov 2016

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DOI: https://doi.org/10.1515/msp-2016-0099 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 735 - 740
Submitted on: Dec 14, 2015
Accepted on: Aug 29, 2016
Published on: Nov 19, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2016 S. Venkatesan, M. Ramu, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.