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Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application Cover

Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application

Materials Science-Poland
Volume 34 (2016): Issue 4 (December 2016)
By: S. Venkatesan and  M. Ramu  
Open Access
|Nov 2016

Figures & Tables

Cross-sectional images of film thickness: (a) 45 μm, (b) 61 μm, (c) 82 μm, and (d) 154 μm of AA 2024 samples obtained at different deposition times.
Cross-sectional images of film thickness: (a) 45 μm, (b) 61 μm, (c) 82 μm, and (d) 154 μm of AA 2024 samples obtained at different deposition times.
SEM images of AA 2024 substrates coated with Ti thin films at different deposition times: (a) 180 s, (b) 300 s, (c) 420 s, and (d) 900 s.
SEM images of AA 2024 substrates coated with Ti thin films at different deposition times: (a) 180 s, (b) 300 s, (c) 420 s, and (d) 900 s.
EDX analysis of AA 2024 sample coated by Ti thin films at different deposition times: (a) 180 s, (b) 300 s, (c) 420 s, and (d) 900 s.
EDX analysis of AA 2024 sample coated by Ti thin films at different deposition times: (a) 180 s, (b) 300 s, (c) 420 s, and (d) 900 s.
Effect of film thickness on hardness.
Effect of film thickness on hardness.
Scratches on titanium coated AA 2024 samples.
Scratches on titanium coated AA 2024 samples.
Effect of film thickness on scratch caused by the applied load (N).
Effect of film thickness on scratch caused by the applied load (N).
A lattice pattern with six lines in each direction made on titanium coated AA 2024 sample (cross hatch test).
A lattice pattern with six lines in each direction made on titanium coated AA 2024 sample (cross hatch test).
Effect of film thickness on surface roughness.
Effect of film thickness on surface roughness.
XRD pattern of Ti film deposited on AA 2024, sample S4 obtained at deposition time of 900 s at substrate temperature of 673 K.
XRD pattern of Ti film deposited on AA 2024, sample S4 obtained at deposition time of 900 s at substrate temperature of 673 K.

Film thickness of samples S0, S1, S2, S3 and S4 for different deposition times and temperatures_

SampleDeposition time [s]Temperature [K]Film thickness [μm]
S0 (uncoated sample)–––
S118037345
S230047360
S342057386
S4900673153
DOI: https://doi.org/10.1515/msp-2016-0099 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 735 - 740
Submitted on: Dec 14, 2015
Accepted on: Aug 29, 2016
Published on: Nov 19, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
titanium,
thin films,
sputtering,
hardness,
MEMS
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 S. Venkatesan, M. Ramu, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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