Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application
By: S. Venkatesan and M. Ramu
Authors
M. Ramu
India
Language: English
Page range: 735 - 740
Submitted on: Dec 14, 2015
Accepted on: Aug 29, 2016
Published on: Nov 19, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
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© 2016 S. Venkatesan, M. Ramu, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.