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The impact of medium frequency pulsed magnetron discharge power on the single probe Langmuir measurements and resulted plasma parameters Cover

The impact of medium frequency pulsed magnetron discharge power on the single probe Langmuir measurements and resulted plasma parameters

Materials Science-Poland
Volume 34 (2016): Issue 2 (June 2016)
By: A Wiatrowski and  W.M Posadowski  
Open Access
|Apr 2016

Figures & Tables

Fig. 1

The WMK-50 magnetron source current and voltage waveforms while driven by the MSS-14 power supply. The voltage waveforms show the difference in the discharge voltage pulses caused by different values of the target material ISEE (Ion induced Secondary Electron Emission) coefficient.

Fig. 2

Waveforms of the MSS-14 power supply output current pulses while driving the WMK-50 magnetron equipped with titanium target. The time point of zero indicates the trigger moment of the oscilloscope time base.

Fig. 3

Details of the Langmuir probe measurements arrangement indicating two chosen spatial positions.

Fig. 4

The electron current curves calculated from Langmuir probe I-V characteristics measured at position No. 1 for (a) titanium and (b) copper sputtering processes, at discharge power of 1; 3; 5 kW.

Fig. 5

The electron current curves calculated from Langmuir probe I-V characteristics measured at position No. 2 for (a) titanium and (b) copper sputtering processes, at discharge power of 1; 3; 5 kW.

Fig. 6

The electron current ratios calculated in electron saturation regions of probe I-V characteristics for (a) titanium and (b) copper sputtering processes.

Fig. 7

Langmuir probe current waveforms recorded during titanium sputtering at +10 V of probe voltage.

Fig. 8

The curves of probe electron current for (a) copper and (b) titanium sputtering processes at position 1, calculated with different value pairs of discharge power (PE1:PE2).
DOI: https://doi.org/10.1515/msp-2016-0012 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 374 - 385
Submitted on: Oct 13, 2015
|
Accepted on: Nov 22, 2015
|
Published on: Apr 20, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
titanium,
copper,
magnetron sputtering,
pulsed magnetron sputtering,
medium frequency pulsed magnetron sputtering,
Langmuir probe measurements,
Dora Power Systems
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 A Wiatrowski, W.M Posadowski, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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