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Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition Cover

Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition

Materials Science-Poland
Volume 33 (2015): Issue 4 (December 2015)
By: ,   and    
Open Access
|Jan 2016
References

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DOI: https://doi.org/10.1515/msp-2015-0116 | Journal eISSN: 2083-134X (formerly 2083-124X) | Journal ISSN: 2083-1331
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Language: English
Page range: 894 - 901
Submitted on: May 31, 2015
Accepted on: Oct 5, 2015
Published on: Jan 6, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Keywords:
OES,
AlN films,
nanocrystalline films,
magnetron sputtering
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 Rafal Chodun, Katarzyna Nowakowska-Langier, Krzysztof Zdunek, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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