Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition
Authors
Rafal Chodun
Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland
Katarzyna Nowakowska-Langier
National Centre for Nuclear Research (NCBJ), Otwock-Swierk, Poland
Krzysztof Zdunek
Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland
Language: English
Page range: 894 - 901
Submitted on: May 31, 2015
Accepted on: Oct 5, 2015
Published on: Jan 6, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Keywords:
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© 2016 Rafal Chodun, Katarzyna Nowakowska-Langier, Krzysztof Zdunek, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.