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Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition Cover

Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition

Materials Science-Poland
Volume 33 (2015): Issue 4 (December 2015)
By: Rafal Chodun,  Katarzyna Nowakowska-Langier and  Krzysztof Zdunek  
Open Access
|Jan 2016

Authors

Rafal Chodun

rafal.chodun@inmat.pw.edu.pl

Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland

Katarzyna Nowakowska-Langier

National Centre for Nuclear Research (NCBJ), Otwock-Swierk, Poland

Krzysztof Zdunek

Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland
DOI: https://doi.org/10.1515/msp-2015-0116 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 894 - 901
Submitted on: May 31, 2015
|
Accepted on: Oct 5, 2015
|
Published on: Jan 6, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
OES,
AlN films,
nanocrystalline films,
magnetron sputtering
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 Rafal Chodun, Katarzyna Nowakowska-Langier, Krzysztof Zdunek, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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