Skip to main content
Have a personal or library account? Click to login
Metal-organic chemical vapour deposition of lithium manganese oxide thin films via single solid source precursor Cover

Metal-organic chemical vapour deposition of lithium manganese oxide thin films via single solid source precursor

Materials Science-Poland
Volume 33 (2015): Issue 4 (December 2015)
By: ,  ,  ,  ,  ,   and    
Open Access
|Jan 2016
Metrics

Metrics

DOI: https://doi.org/10.1515/msp-2015-0102 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Journal RSS Feed
Language: English
Page range: 725 - 731
Submitted on: Dec 8, 2014
Accepted on: Aug 25, 2015
Published on: Jan 6, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
MOCVD,
thin film,
pyrolysis,
Li0.47Mn0.27O0.26,
Rutherford backscattering,
bandgap energy
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 K.O. Oyedotun, E. Ajenifuja, B. Olofinjana, B.A. Taleatu, E. Omotoso, M.A. Eleruja, E.O.B. Ajayi, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Volume 33 (2015): Issue 4 (December 2015)
Previous article
Next article