Properties of AlN thin films deposited by means of magnetron sputtering for ISFET applications

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Open Access

|Jan 2016

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DOI: https://doi.org/10.1515/msp-2015-0095 | Journal eISSN: 2083-134X (formerly 2083-124X) | Journal ISSN: 2083-1331

Language: English

Page range: 669 - 676

Submitted on: Jan 13, 2014

Accepted on: Jun 16, 2015

Published on: Jan 6, 2016

Published by: Wroclaw University of Science and Technology

In partnership with: Paradigm Publishing Services

Keywords:

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© 2016 Piotr Firek, Michał Wáskiewicz, Bartłomiej Stonio, Jan Szmidt, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.