Properties of AlN thin films deposited by means of magnetron sputtering for ISFET applications
Authors
Piotr Firek
Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Warsaw, Poland
Michał Wáskiewicz
Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Warsaw, Poland
Bartłomiej Stonio
Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Warsaw, Poland
Jan Szmidt
Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Warsaw, Poland
Language: English
Page range: 669 - 676
Submitted on: Jan 13, 2014
Accepted on: Jun 16, 2015
Published on: Jan 6, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
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© 2016 Piotr Firek, Michał Wáskiewicz, Bartłomiej Stonio, Jan Szmidt, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.