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UV-Vis studies of 800 keV Ar ion irradiated NiO thin films Cover

UV-Vis studies of 800 keV Ar ion irradiated NiO thin films

Open Access
|Aug 2016

References

  1. [1] ZHAI P., YI Q., JIAN J., WANG H., SONG P., DONG C., LU X., SUN Y., ZHAO J., DAI X., LOU Y., YANG H., ZOU G., Chem. Commun., 50 (2014), 1854.10.1039/c3cc48877b24402170
  2. [2] AL-KAHLOUT A., PAWLICKA A., AEGERTER M., Sol. Energy Mater. Sol. C, 90 (2006), 3583.10.1016/j.solmat.2006.06.053
  3. [3] LOU XC, ZHAO XJ, HE X, Sol. Energy, 83 (2009), 2103.10.1016/j.solener.2009.06.020
  4. [4] IRWIN M.D., BUCHHOLZ D.B., HAINS A.W., CHANG R.P.H., MARKS T.J., Proc. Natl. Acad. Sci. USA, 105 (2008), 2783.10.1073/pnas.0711990105
  5. [5] STEINEBACH H, KANNAN S, RIETH L, SOLZBACHER F, Sensor. Actuat. B-Chem., 151 (2010), 162.10.1016/j.snb.2010.09.027
  6. [6] TSAI S.-Y., HON M.-H., LU Y.-M., Solid-State Electron., 63 (2011), 37.10.1016/j.sse.2011.04.019
  7. [7] LEE Y.-M., YANG H.-W., HUANG C.-M, J. Phys. D Appl. Phys., 45 (2012), 225302.10.1088/0022-3727/45/22/225302
  8. [8] MALLICK P., AGARWAL D.C., RATH CHANDANA, BISWAL R., BEHERA D., AVASTHI D.K., KANJILAL D., SATYAM P.V., MISHRA N.C., Nucl. Instrum. Meth. B, 266 (2008), 3332.10.1016/j.nimb.2008.04.013
  9. [9] MALLICK P., RATH CHANDANA, PRAKASH JAI, MISHRA D.K., CHOUDHARY R.J., PHASE D.M., TRIPATHI A., AVASTHI D.K., KANJILAL D., MISHRA N.C., Nucl. Instrum. Meth. B, 268 (2010), 1613.10.1016/j.nimb.2010.02.005
  10. [10] MALLICK P., DASH B.N., SOLANKI V., VARMA S., MISHRA N.C., Adv. Sci. Eng. Med., 6 (10) (2014), 1118.10.1166/asem.2014.1620
  11. [11] REGUIG B.A., KHELIL A., CATTIN L., MORSLI M., BERNEDE J.C., Appl. Surf. Sci., 253 (2007), 4330.10.1016/j.apsusc.2006.09.046
  12. [12] CHEN H.L., LU Y.M., HWANG W.S., Surf. Coat. Technol., 198 (2005), 138.10.1016/j.surfcoat.2004.10.032
  13. [13] MOHANTY P., RATH CHANDANA, MALLICK P., BISWAL R., MISHRA N.C., Physica B, 405 (2010), 2711.10.1016/j.physb.2010.03.064
  14. [14] AHMAD S., ASHRAF M., AHMAD A., SINGH D.V., Arab. J. Sci. Eng., 38 (2013), 1889.10.1007/s13369-013-0551-z
  15. [15] MALLICK P., MISHRA D.K., KUMAR P., KANJILAL D., Indian J. Phys., 88 (7) (2014), 691.10.1007/s12648-014-0474-x
  16. [16] KUMAR P., RODRIGUES G., RAO U.K., SAFVAN C.P., KANJILAL D., ROY A., Pramana, 59 (2002), 805.10.1007/s12043-002-0094-4
  17. [17] MOTT N.F., DAVIES E.A., Electronic Processes in Non-Crystalline Materials, Clarendon Press, Oxford, 1979.
  18. [18] BANERJEE A.N., CHATTOPADHYAY K.K., Reactive SputteredWide-Bandgap p-Type Semiconducting Spinel AB, in: DEPLA D., MAHEIU S. (Eds.), Reactive Sputter Deposition, Springer-Verlag, Berlin Heidelberg, 2008, p.413.10.1007/978-3-540-76664-3_12
  19. [19] LI X, ZHANG X, LI Z, QIAN Y, Solid State Commun., 137 (2006), 581.10.1016/j.ssc.2006.01.031
  20. [20] POWELL R.J., SPICER W.E., Phys. Rev. B, 2 (1970), 2182.10.1103/PhysRevB.2.2182
  21. [21] KUIPER P., KRUIZINGA G., GHIJSEN J., SAWATZKY G.A., VERWEIJ H., Phys. Rev. Lett., 2 (1989), 221.10.1103/PhysRevLett.62.22110039954
  22. [22] HUFNER S., STEINER P., REINERT F., SCHMITT H., SANDL P., Z. Phys. B, 88 (1992), 247.10.1007/BF01323579
  23. [23] MACKRODT W.C., NOGUERA C., Surf. Sci., 457 (2000), L386.10.1016/S0039-6028(00)00405-2
  24. [24] KUMAR V., SINGH J.K., Ind. J. Pure Appl. Phys., 48 (2010), 571.
  25. [25] FREITAG A., STAEMMLER V., CAPPUS D., VENTRICE C.A., AL SHAMERY K., KUHLENBECK H., FREUND H.-J., Chem. Phys. Lett., 210 (1993), 10.10.1016/0009-2614(93)89091-U
  26. [26] NEWMAN R., CHRENKO R.M., Phys. Rev., 114 (1959), 1507.10.1103/PhysRev.114.1507
  27. [27] PROPACH V., REINEN D., DRENKHALN H., BUSCHBAUM H. MULLER, Z. Naturforsch., 33b (1978) 619.10.1515/znb-1978-0611
  28. [28] COX P.A., WILLIAMS A.A., Surf. Sci., 152 (1985), 791.10.1016/0039-6028(85)90489-3
  29. [29] FROMME B., SCHMITT M., KISKER E., GORSCHLU¨TER A., MERZ H., Phys. Rev. B, 50 (1994), 1874.10.1103/PhysRevB.50.1874
  30. [30] GRAAF C. DE, BROER R., NIEUWPOORT W.C., Chem. Phys., 208 (1996), 35.10.1016/0301-0104(96)00083-3
  31. [31] SATITKOVITCHAI K., PAVLYUKH Y., HÜBNER W., Phys. Rev. B, 67 (2003), 165413.10.1103/PhysRevB.67.165413
  32. [32] GELEIJNS M., GRAAF C. DE, BROER R., NIEUWPOORT W.C., Surf. Sci., 421 (1999), 106.10.1016/S0039-6028(98)00835-8
  33. [33] MACKRODT W.C., NOGUERA C., ALLAN N.L., Faraday Discuss., 114 (1999), 105.10.1039/a904185k
  34. [34] FROMME B., MÖLLER M., ANSCHÜTZ TH., BETHKE C., KISKER E., Phys. Rev. Lett., 77 (1996), 1548.10.1103/PhysRevLett.77.154810063106
  35. [35] XU C., OH W.S., GUO Q., GOODMAN D.W., J. Vac.Sci. Technol. A, 14 (1996), 1395.10.1116/1.579960
  36. [36] GUO Q., XU C., GOODMAN D.W., Langmuir, 14 (1998), 1371. 10.1021/la9707235
DOI: https://doi.org/10.1515/msp-2015-0082 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 555 - 559
Submitted on: Nov 4, 2014
Accepted on: May 19, 2015
Published on: Aug 30, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2016 P. Mallick, D.K. Mishra, P. Kumar, D. Kanjilal, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.