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On Both Spatial And Velocity Distribution Of Sputtered Particles In Magnetron Discharge Cover

On Both Spatial And Velocity Distribution Of Sputtered Particles In Magnetron Discharge

By: C. Vitelaru,  V. Pohoata,  V. Tiron,  C. Costin and  G. Popa  
Open Access
|Oct 2015

Abstract

The kinetics of the sputtered atoms from the metallic target as well as the time-space distribution of the argon metastable atoms have been investigated for DC and high power pulse magnetron discharge by means of Tunable Diode – Laser Absorption Spectroscopy (TD-LAS) and Tunable Diode – Laser Induced Fluorescence (TD-LIF). The discharge was operated in argon (5-30 mTorr) with two different targets, tungsten and aluminum, for pulses of 1 to 20 μs, at frequencies of 0.2 to 1 kHz. Peak current intensity of ~100 A has been attained at cathode peak voltage of ~1 kV. The mean velocity distribution functions and particle fluxes of the sputtered metal atoms, in parallel and perpendicular direction to the target, have been obtained and compared for DC and pulse mode.

DOI: https://doi.org/10.1515/awutp-2015-0007 | Journal eISSN: 2784-1057 | Journal ISSN: 1224-9718
Language: English
Page range: 43 - 57
Submitted on: Dec 28, 2011
Accepted on: Jan 19, 2012
Published on: Oct 5, 2015
Published by: West University of Timisoara
In partnership with: Paradigm Publishing Services
Publication frequency: 1 issue per year

© 2015 C. Vitelaru, V. Pohoata, V. Tiron, C. Costin, G. Popa, published by West University of Timisoara
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.