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Semiconductor Strain Metrology: Principles and Applications Cover

Semiconductor Strain Metrology: Principles and Applications

Publisher:Bentham Science
By:   
Paid access
|Feb 2025
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Description
This book surveys the major and newly developed techniques for semiconductor strain metrology. Semiconductor strain metrology has emerged in recent years as a topic of great interest to researchers involved in thin film and nanoscale device characterization. This e-book employs a tutorial approach to explain the principles and applications of each technique specifically tailored for graduate students and postdoctoral researchers. Selected topics include optical electron beam ion beam and synchrotron x-ray techniques. Unlike earlier references this e-book specifically discusses strain metrology as applied to semiconductor devices with both depth and focus.
PDF ISBN: 978-1-60805-359-9
Publisher: Bentham Science
Copyright owner: © 2012 Bentham Science Publishers
Publication date: 2025
Language: English
Pages: 141
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other
BISAC subjects:
TEC008090
Thema subjects:
TJFD

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