Semiconductor Strain Metrology: Principles and Applications

Publisher:Bentham Science

By: Terence K.S Wong

Paid access

|Feb 2025

E-Book €53.99Institutions €228.95

Description

This book surveys the major and newly developed techniques for semiconductor strain metrology. Semiconductor strain metrology has emerged in recent years as a topic of great interest to researchers involved in thin film and nanoscale device characterization. This e-book employs a tutorial approach to explain the principles and applications of each technique specifically tailored for graduate students and postdoctoral researchers. Selected topics include optical electron beam ion beam and synchrotron x-ray techniques. Unlike earlier references this e-book specifically discusses strain metrology as applied to semiconductor devices with both depth and focus.

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PDF ISBN: 978-1-60805-359-9

Publisher: Bentham Science

Publication date: 2025

Language: English

Pages: 141

Related subjects:

Engineering,

Introductions and overviews,

Engineering, other