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Gadolinium Scandate: Next Candidate for Alternative Gate Dielectric in CMOS Technology? Cover

Gadolinium Scandate: Next Candidate for Alternative Gate Dielectric in CMOS Technology?

Journal of Electrical Engineering
Volume 62 (2011): Issue 1 (January 2011)
By: ,  ,  ,   and    
Open Access
|Jun 2011
References

References

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DOI: https://doi.org/10.2478/v10187-011-0009-z | Journal eISSN: 1339-309X (formerly 1335-3632) | Journal ISSN: 1335-3632
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Language: English
Page range: 54 - 56
Published online: Jun 7, 2011
Published in print: Jan 1, 2011
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Keywords:
CMOS technology,
gate dielectric,
high-κ,
X-ray diffraction,
X-ray reflectivity
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2011 Karol Fröhlich, Ján Fedor, Ivan Kostič, Ján Maňka, Peter Ballo, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons License.

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