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Gadolinium Scandate: Next Candidate for Alternative Gate Dielectric in CMOS Technology? Cover

Gadolinium Scandate: Next Candidate for Alternative Gate Dielectric in CMOS Technology?

Journal of Electrical Engineering
Volume 62 (2011): Issue 1 (January 2011)
By: ,  ,  ,   and    
Open Access
|Jun 2011
Articles in this issue
DOI: https://doi.org/10.2478/v10187-011-0009-z | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
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Language: English
Page range: 54 - 56
Published on: Jun 7, 2011
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
CMOS technology,
gate dielectric,
high-κ,
X-ray diffraction,
X-ray reflectivity
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2011 Karol Fröhlich, Ján Fedor, Ivan Kostič, Ján Maňka, Peter Ballo, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons License.

Volume 62 (2011): Issue 1 (January 2011)