Preparation and microstructural characterization of Si(100) Ce1−x GdxO2−δ thin films prepared by pulsed laser deposition technique
By: P. Nagaraju, Y. Vijayakumar, D. Phase, V. Reddy and M. Ramana Reddy
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DOI: https://doi.org/10.2478/s13536-014-0246-5 | Journal eISSN: 2083-134X (formerly 2083-124X) | Journal ISSN: 2083-1331
Language: English
Page range: 541 - 546
Published on: Dec 19, 2014
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
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© 2014 P. Nagaraju, Y. Vijayakumar, D. Phase, V. Reddy, M. Ramana Reddy, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.