Application of triton X-100 surfactant for silicon anisotropic etching in KOH-based solutions
By: Krzysztof Rola and Irena Zubel
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DOI: https://doi.org/10.2478/s13536-013-0130-8 | Journal eISSN: 2083-134X (formerly 2083-124X) | Journal ISSN: 2083-1331
Language: English
Page range: 525 - 530
Published on: Dec 15, 2013
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
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© 2013 Krzysztof Rola, Irena Zubel, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.