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Application of triton X-100 surfactant for silicon anisotropic etching in KOH-based solutions Cover

Application of triton X-100 surfactant for silicon anisotropic etching in KOH-based solutions

Materials Science-Poland
Volume 31 (2013): Issue 4 (October 2013)
By: Krzysztof Rola and  Irena Zubel  
Open Access
|Dec 2013

Authors

Krzysztof Rola

krzysztof.rola@pwr.wroc.pl

Irena Zubel

DOI: https://doi.org/10.2478/s13536-013-0130-8 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 525 - 530
Published on: Dec 15, 2013
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2013 Krzysztof Rola, Irena Zubel, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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