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Study on etching anisotropy of Si(hkl) planes in solutions with different KOH and isopropyl alcohol concentrations Cover

Study on etching anisotropy of Si(hkl) planes in solutions with different KOH and isopropyl alcohol concentrations

Materials Science-Poland
Volume 29 (2011): Issue 4 (December 2011)
By: K. Rola and  I. Zubel  
Open Access
|May 2012

References

  1. [1] PUERS B. and SANSEN W., Sens. Actuators, A, 23 (1990), 1036. http://dx.doi.org/10.1016/0924-4247(90)87085-W10.1016/0924-4247(90)87085-W
    Search in Google Scholar
  2. [2] ZUBEL I. and KRAMKOWSKA M., Sens. Actuators, A, 93 (2001), 138. http://dx.doi.org/10.1016/S0924-4247(01)00648-310.1016/S0924-4247(01)00648-3
    Search in Google Scholar
  3. [3] ZUBEL I, Sens. Actuators, A, 94 (2001), 76–86. http://dx.doi.org/10.1016/S0924-4247(01)00690-210.1016/S0924-4247(01)00690-2
    Search in Google Scholar
  4. [4] ZUBEL I. and KRAMKOWSKA M., Surf. Sci., 602 (2008), 1712. http://dx.doi.org/10.1016/j.susc.2008.03.01010.1016/j.susc.2008.03.010
    Search in Google Scholar
  5. [5] ROLA K.P. and ZUBEL I., Cent. Eur. J. Phys., 9 (2011), 410. http://dx.doi.org/10.2478/s11534-010-0114-910.2478/s11534-010-0114-9
    Search in Google Scholar
  6. [6] HYLTON J.D., BURGERS A.R. and SINKE W.C., J. Electrochem. Soc., 151 (2004), G408. http://dx.doi.org/10.1149/1.173813710.1149/1.1738137
    Search in Google Scholar
  7. [7] ZUBEL I. and KRAMKOWSKA M., J. Microelectromech. Syst., 16 (2007), 1411. http://dx.doi.org/10.1109/JMEMS.2007.90875310.1109/JMEMS.2007.908753
    Search in Google Scholar
  8. [8] ZUBEL I. and KRAMKOWSKA M., J. Micromech. Microeng., 15 (2005), 485. http://dx.doi.org/10.1088/0960-1317/15/3/00810.1088/0960-1317/15/3/008
    Search in Google Scholar
  9. [9] RESNIK D., VRTACNIK D. and AMON S., J. Micromech. Microeng., 10 (2000), 430. http://dx.doi.org/10.1088/0960-1317/10/3/31910.1088/0960-1317/10/3/319
    Search in Google Scholar
  10. [10] XU Y.W., MICHAEL A. and KWOK C.Y., Sens. Actuators, A, 166 (2011), 164. http://dx.doi.org/10.1016/j.sna.2010.12.01810.1016/j.sna.2010.12.018
    Search in Google Scholar
  11. [11] ZUBEL I. and ROLA K., Opt. Appl., 41 (2011), 423.
    Search in Google Scholar
  12. [12] PAL P., SATO K., GOSALVEZ M.A., KIMURA Y., ISHIBASHI K-I., NIWANO M., HIDA H., BIN TANG and ITOH S., J. Microelectromech. Syst., 18 (2009), 1345. http://dx.doi.org/10.1109/JMEMS.2009.203168810.1109/JMEMS.2009.2031688
    Search in Google Scholar
  13. [13] ZUBEL I. and KRAMKOWSKA M., Acta Phys. Pol., A, 116 (2009), s105. 10.12693/APhysPolA.116.S-105
    Search in Google Scholar
  14. [14] SEIDEL H., CSEPREGI L., HEUBERGER A. and BAUMGÄRTEL H., J. Electrochem. Soc., 137 (1990), 3612. http://dx.doi.org/10.1149/1.208627710.1149/1.2086277
    Search in Google Scholar
  15. [15] ZUBEL I., ROLA K. and KRAMKOWSKA M., Sens. Actuators, A, 171 (2011), 436. http://dx.doi.org/10.1016/j.sna.2011.09.00510.1016/j.sna.2011.09.005
    Search in Google Scholar
  16. [16] GOSALVEZ M.A., SATO K., FOSTER A.S., NIEMINEN R.M. and TANAKA H., J. Micromech. Microeng., 17 (2007), S1. http://dx.doi.org/10.1088/0960-1317/17/4/S0110.1088/0960-1317/17/4/S01
    Search in Google Scholar
DOI: https://doi.org/10.2478/s13536-011-0047-z | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Journal RSS Feed
Language: English
Page range: 278 - 284
Published on: May 8, 2012
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
anisotropic etching,
silicon surface,
potassium hydroxide,
isopropanol concentration,
(hkl) planes
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2012 K. Rola, I. Zubel, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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