Skip to main content
Have a personal or library account? Click to login
Study on etching anisotropy of Si(hkl) planes in solutions with different KOH and isopropyl alcohol concentrations Cover

Study on etching anisotropy of Si(hkl) planes in solutions with different KOH and isopropyl alcohol concentrations

Materials Science-Poland
Volume 29 (2011): Issue 4 (December 2011)
By:  and    
Open Access
|May 2012
References

References

  1. [1] PUERS B. and SANSEN W., Sens. Actuators, A, 23 (1990), 1036. http://dx.doi.org/10.1016/0924-4247(90)87085-W
    Open DOISearch in Google Scholar
  2. [2] ZUBEL I. and KRAMKOWSKA M., Sens. Actuators, A, 93 (2001), 138. http://dx.doi.org/10.1016/S0924-4247(01)00648-3
    Open DOISearch in Google Scholar
  3. [3] ZUBEL I, Sens. Actuators, A, 94 (2001), 76–86. http://dx.doi.org/10.1016/S0924-4247(01)00690-2
    Open DOISearch in Google Scholar
  4. [4] ZUBEL I. and KRAMKOWSKA M., Surf. Sci., 602 (2008), 1712. http://dx.doi.org/10.1016/j.susc.2008.03.010
    Open DOISearch in Google Scholar
  5. [5] ROLA K.P. and ZUBEL I., Cent. Eur. J. Phys., 9 (2011), 410. http://dx.doi.org/10.2478/s11534-010-0114-9
    Open DOISearch in Google Scholar
  6. [6] HYLTON J.D., BURGERS A.R. and SINKE W.C., J. Electrochem. Soc., 151 (2004), G408. http://dx.doi.org/10.1149/1.1738137
    Open DOISearch in Google Scholar
  7. [7] ZUBEL I. and KRAMKOWSKA M., J. Microelectromech. Syst., 16 (2007), 1411. http://dx.doi.org/10.1109/JMEMS.2007.908753
    Open DOISearch in Google Scholar
  8. [8] ZUBEL I. and KRAMKOWSKA M., J. Micromech. Microeng., 15 (2005), 485. http://dx.doi.org/10.1088/0960-1317/15/3/008
    Open DOISearch in Google Scholar
  9. [9] RESNIK D., VRTACNIK D. and AMON S., J. Micromech. Microeng., 10 (2000), 430. http://dx.doi.org/10.1088/0960-1317/10/3/319
    Open DOISearch in Google Scholar
  10. [10] XU Y.W., MICHAEL A. and KWOK C.Y., Sens. Actuators, A, 166 (2011), 164. http://dx.doi.org/10.1016/j.sna.2010.12.018
    Open DOISearch in Google Scholar
  11. [11] ZUBEL I. and ROLA K., Opt. Appl., 41 (2011), 423.
    Search in Google Scholar
  12. [12] PAL P., SATO K., GOSALVEZ M.A., KIMURA Y., ISHIBASHI K-I., NIWANO M., HIDA H., BIN TANG and ITOH S., J. Microelectromech. Syst., 18 (2009), 1345. http://dx.doi.org/10.1109/JMEMS.2009.2031688
    Open DOISearch in Google Scholar
  13. [13] ZUBEL I. and KRAMKOWSKA M., Acta Phys. Pol., A, 116 (2009), s105.
    Open DOISearch in Google Scholar
  14. [14] SEIDEL H., CSEPREGI L., HEUBERGER A. and BAUMGÄRTEL H., J. Electrochem. Soc., 137 (1990), 3612. http://dx.doi.org/10.1149/1.2086277
    Open DOISearch in Google Scholar
  15. [15] ZUBEL I., ROLA K. and KRAMKOWSKA M., Sens. Actuators, A, 171 (2011), 436. http://dx.doi.org/10.1016/j.sna.2011.09.005
    Open DOISearch in Google Scholar
  16. [16] GOSALVEZ M.A., SATO K., FOSTER A.S., NIEMINEN R.M. and TANAKA H., J. Micromech. Microeng., 17 (2007), S1. http://dx.doi.org/10.1088/0960-1317/17/4/S01
    Open DOISearch in Google Scholar
DOI: https://doi.org/10.2478/s13536-011-0047-z | Journal eISSN: 2083-134X (formerly 2083-124X) | Journal ISSN: 2083-1331
Journal RSS Feed
Language: English
Page range: 278 - 284
Published on: May 8, 2012
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Keywords:
anisotropic etching,
silicon surface,
potassium hydroxide,
isopropanol concentration,
(hkl) planes
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2012 K. Rola, I. Zubel, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Volume 29 (2011): Issue 4 (December 2011)
Previous article
Next article