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Enhanced antireflective and laser damage resistance of refractive-index gradient SiO2 nanostructured films at 1064 nm Cover

Enhanced antireflective and laser damage resistance of refractive-index gradient SiO2 nanostructured films at 1064 nm

Open Access
|Jul 2024

Authors

Lili Wan

Joint Laboratory for Extreme Conditions Matter Properties, School of Mathematics and Physics, Southwest University of Science and Technology, Mianyang, China

Jie Yang

Joint Laboratory for Extreme Conditions Matter Properties, School of Mathematics and Physics, Southwest University of Science and Technology, Mianyang, China

Xiaoru Liu

Joint Laboratory for Extreme Conditions Matter Properties, School of Mathematics and Physics, Southwest University of Science and Technology, Mianyang, China

Jiayi Zhu

jyzhu@swust.edu.cn

Joint Laboratory for Extreme Conditions Matter Properties, School of Mathematics and Physics, Southwest University of Science and Technology, Mianyang, China
Key Laboratory of Icing and Anti/De-icing, China Aerodynamics Research and Development Center, Mianyang, China

Gang Xu

Joint Laboratory for Extreme Conditions Matter Properties, School of Mathematics and Physics, Southwest University of Science and Technology, Mianyang, China

Chenchun Hao

Joint Laboratory for Extreme Conditions Matter Properties, School of Mathematics and Physics, Southwest University of Science and Technology, Mianyang, China

Xuecheng Chen

Department of Nanomaterials Physicochemistry, Faculty of Chemical Technology and Engineering, West Pomeranian University of Technology, Szczecin, Poland

Zhengwei Xiong

zw-xiong@swust.edu.cn

Joint Laboratory for Extreme Conditions Matter Properties, School of Mathematics and Physics, Southwest University of Science and Technology, Mianyang, China
Language: English
Page range: 25 - 30
Published on: Jul 12, 2024
Published by: West Pomeranian University of Technology, Szczecin
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2024 Lili Wan, Jie Yang, Xiaoru Liu, Jiayi Zhu, Gang Xu, Chenchun Hao, Xuecheng Chen, Zhengwei Xiong, published by West Pomeranian University of Technology, Szczecin
This work is licensed under the Creative Commons Attribution 4.0 License.