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Enhancing the supercapacitor performance of MoS2 nanostructures through metallic phase enrichment and morphology control Cover

Enhancing the supercapacitor performance of MoS2 nanostructures through metallic phase enrichment and morphology control

Open Access
|Dec 2025

Figures & Tables

Figure 1

XRD patterns for (a) CVD MoS2 and (b) HT MoS2.
XRD patterns for (a) CVD MoS2 and (b) HT MoS2.

Figure 2

(a) Raman spectra for CVD MoS2 and (b) Raman spectra for HT MoS2.
(a) Raman spectra for CVD MoS2 and (b) Raman spectra for HT MoS2.

Figure 3

(a) FTIR spectra for CVD MoS2 and (b) FTIR spectra for HT MoS2.
(a) FTIR spectra for CVD MoS2 and (b) FTIR spectra for HT MoS2.

Figure 4

(a and b) SEM images of CVD-MoS2. (c and d) SEM images of HT-MoS2. (e) EDX spectra of CVD-MoS2. (f) EDX spectra of HT-MoS2.
(a and b) SEM images of CVD-MoS2. (c and d) SEM images of HT-MoS2. (e) EDX spectra of CVD-MoS2. (f) EDX spectra of HT-MoS2.

Figure 5

(a–c) Different magnification HRTEM images for the HT MoS2 sample. (d) HRTEM shows layer structures with an average layer interspacing of 0.755 nm. (e) SAED pattern for the HT-MoS2 sample.
(a–c) Different magnification HRTEM images for the HT MoS2 sample. (d) HRTEM shows layer structures with an average layer interspacing of 0.755 nm. (e) SAED pattern for the HT-MoS2 sample.

Figure 6

Comparative (a) CV, (b) CD, and (c) calculated specific capacitance of the HT-MoS2 and CVD-MoS2 electrodes at fixed current loads.
Comparative (a) CV, (b) CD, and (c) calculated specific capacitance of the HT-MoS2 and CVD-MoS2 electrodes at fixed current loads.

Figure 7

CV profile of the (a) CVD-MoS2 and (b) HT-MoS2, and GCD profile of the (c) CVD-MoS2 and (d) HT-MoS2 electrodes.
CV profile of the (a) CVD-MoS2 and (b) HT-MoS2, and GCD profile of the (c) CVD-MoS2 and (d) HT-MoS2 electrodes.

Figure 8

Percent retention profile of the HT-MoS2 electrode.
Percent retention profile of the HT-MoS2 electrode.
DOI: https://doi.org/10.2478/msp-2025-0047 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 122 - 133
Submitted on: Oct 21, 2025
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Accepted on: Dec 30, 2025
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Published on: Dec 31, 2025
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2025 Shrouq H. Aleithan, Sajid Ali Ansari, Shroq S. Laradhi, Khan Alam, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.