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Experimental investigation of the electrochemical micromachining process of Ti-6Al-4V titanium alloy under the influence of magnetic field Cover

Experimental investigation of the electrochemical micromachining process of Ti-6Al-4V titanium alloy under the influence of magnetic field

Open Access
|Jul 2021

Figures & Tables

Fig. 1

Experimental setup for ECMM. ECMM, electrochemical micromachining.

Table 1

Experimental details of ECMM setup.

ParametersRange
Working voltage150 V DC
Gap voltage0–10 V
ElectrolyteNaNO3 + Water
MagnetsNeodymium 40 × 20 × 10 mm
ToolCopper: ϕ 0.6 mm
WorkpieceTi-6Al-4V: 30 × 10 × 0.1 mm
Process parametersSymbols Levels
Peak current (mA)Ip1.21.351.5
Pulse on time (ms)Ton300400500
Duty factorDF0.50.60.7
Concentration of electrolyte (%)C15225 30

[i] ECMM, electrochemical micromachining.

Fig. 2

Magnetic field measurement of magnets using gauss meter.

Fig. 3

Placement of magnets in the machining cycle.

Table 2

Orthogonal array experiment (L27) for magnetic and nonmagnetic field ECMM of Ti-6Al-4V titanium alloy.

No magnetic forceAttraction magnetic forceRepulsion magnetic force
S. No.Concentration of electrolyte (g/l)Ip (A)Ton (μs)DFMRR 10−3 (mm3/min)OC (mm)MRR 10−3 (mm3/min)OC (mm)MRR 10−3 (mm3/min)OC (mm)
1151.203000.50.590.320.660.250.720.21
2151.203000.50.590.320.660.250.730.21
3151.203000.50.590.320.660.260.730.22
4151.354000.60.970.351.480.312.220.28
5151.354000.60.970.351.470.312.220.28
6151.354000.60.960.351.470.312.210.28
7151.505000.70.720.330.880.281.460.24
8151.505000.70.720.330.880.281.460.24
9151.505000.70.720.330.870.281.470.24
1022.51.204000.70.600.430.680.390.780.34
1122.51.204000.70.590.430.680.390.790.35
1222.51.204000.70.590.430.680.390.790.34
1322.51.355000.50.720.320.890.271.500.23
1422.51.355000.50.730.320.870.271.520.24
1522.51.355000.50.730.320.890.261.510.23
1622.51.503000.60.620.300.720.240.850.22
1722.51.503000.60.620.300.720.240.850.22
1822.51.503000.60.620.290.720.240.840.22
19301.205000.60.760.340.970.291.600.26
20301.205000.60.760.340.950.291.570.26
21301.205000.60.770.340.960.281.590.26
22301.353000.70.640.370.780.341.000.30
23301.353000.70.640.370.780.340.990.30
24301.353000.70.650.370.780.340.990.30
25301.504000.50.620.350.700.310.820.26
26301.504000.50.630.350.730.310.840.26
27301.504000.50.620.350.710.330.830.27

[i] ECMM, electrochemical micromachining; MRR, material removal rate; OC, overcut.

Fig. 4

Methodology of TOPSIS (close to ideal solution).

Table 3

Computational steps of SIMOS weighting procedure.

Subset criteriaNumber of criteria (variables)Number of positionNon-normalized weighted matrixTotal (%)
MRR111/2*100 = 50~5050
OC1211/2*100 =50~5050

[i] MRR, material removal rate; OC, overcut.

Table 4

TOPSIS evaluation for ECMM of Ti-6Al-4V under nonmagnetic field.

S. No.Concentration of electrolyte (g/l)Ip (A)Ton (μs)DFWeighted matrixDistance from ideal solutionCloseness coefficientRank
WMRRWOCEij+EijCCij
1151.203000.50.080.090.050.030.3618
2151.203000.50.080.090.050.030.3716
3151.203000.50.080.090.050.030.3617
4151.354000.60.130.100.020.060.783
5151.354000.60.130.100.020.060.781
6151.354000.60.130.100.020.060.782
7151.505000.70.100.090.040.030.4810
8151.505000.70.100.090.040.030.4812
9151.505000.70.100.090.040.030.4811
1022.51.204000.70.080.120.060.000.0325
1122.51.204000.70.080.120.070.000.0027
1222.51.204000.70.080.120.060.000.0126
1322.51.355000.50.100.090.040.040.508
1422.51.355000.50.100.090.040.030.509
1522.51.355000.50.100.090.030.040.517
1622.51.503000.60.080.080.050.040.4315
1722.51.503000.60.090.080.050.040.4314
1822.51.503000.60.090.080.050.040.4413
19301.205000.60.100.090.030.030.524
20301.205000.60.100.090.030.030.515
21301.205000.60.100.100.030.030.516
22301.353000.70.090.100.050.020.2424
23301.353000.70.090.100.050.020.2523
24301.353000.70.090.100.050.020.2622
25301.504000.50.080.100.050.020.3121
26301.504000.50.090.100.050.020.3219
27301.504000.50.090.100.050.020.3120

[i] ECMM, electrochemical micromachining.

Table 5

TOPSIS evaluation for ECMM of Ti-6Al-4V under magnetic field (attraction).

S. No.Concentration of electrolyte (g/l)Ip (A)Ton (μs)DFWeighted matrixDistance from ideal solutionCloseness coefficientRank
WMRRWOCEij+EijCCij
1151.203000.50.070.080.090.050.3416
2151.203000.50.070.080.090.040.3417
3151.203000.50.070.080.090.040.3318
4151.354000.60.160.100.020.090.821
5151.354000.60.160.100.020.090.803
6151.354000.60.160.100.020.090.822
7151.505000.70.090.090.070.040.4010
8151.505000.70.090.090.070.040.4011
9151.505000.70.090.090.070.040.4012
1022.51.204000.70.070.130.100.000.0326
1122.51.204000.70.070.130.100.000.0327
1222.51.204000.70.070.120.100.000.0325
1322.51.355000.50.100.090.060.050.438
1422.51.355000.50.090.090.070.050.419
1522.51.355000.50.100.080.060.050.446
1622.51.503000.60.080.080.080.050.3714
1722.51.503000.60.080.080.080.050.3715
1822.51.503000.60.080.080.080.050.3713
19301.205000.60.100.090.060.050.455
20301.205000.60.100.090.060.050.447
21301.205000.60.100.090.060.050.464
22301.353000.70.080.110.080.020.2122
23301.353000.70.080.110.080.020.2123
24301.353000.70.080.110.080.020.2221
25301.504000.50.080.100.090.030.2520
26301.504000.50.080.100.080.030.2619
27301.504000.50.080.100.090.020.2024

[i] ECMM, electrochemical micromachining.

Table 6

TOPSIS evaluation for ECMM of Ti-6Al-4V under magnetic field (repulsion).

S. No.Concentration of electrolyte (g/l)Ip (A)Ton (μs)DFWeighted matrixDistance from ideal solutionCloseness coefficientRank
WMRRWOCEij+EijCCij
1151.203000.50.050.080.110.050.3017
2151.203000.50.050.080.110.050.3116
3151.203000.50.050.080.110.050.3018
4151.354000.60.160.100.020.110.821
5151.354000.60.160.100.030.110.822
6151.354000.60.160.100.030.110.813
7151.505000.70.110.090.060.070.5411
8151.505000.70.110.090.060.070.5312
9151.505000.70.110.090.060.070.5410
1022.51.204000.70.060.120.110.010.0525
1122.51.204000.70.060.130.120.010.0427
1222.51.204000.70.060.120.110.010.0526
1322.51.355000.50.110.080.050.070.579
1422.51.355000.50.110.090.050.070.578
1522.51.355000.50.110.090.050.070.577
1622.51.503000.60.060.080.100.050.3213
1722.51.503000.60.060.080.100.050.3215
1822.51.503000.60.060.080.100.050.3214
19301.205000.60.120.090.050.070.604
20301.205000.60.120.090.050.070.586
21301.205000.60.120.100.050.070.585
22301.353000.70.070.110.100.030.2221
23301.353000.70.070.110.100.030.2124
24301.353000.70.070.110.100.030.2123
25301.504000.50.060.100.100.030.2320
26301.504000.50.060.100.100.030.2319
27301.504000.50.060.100.100.030.2222

[i] ECMM, electrochemical micromachining.

Table 7

Improvement in response factors in presence of magnetic field with respect to nonmagnetic field electrochemical micromachined Ti-6Al-4V.

% Increase in MRR% Decrease in OC
Concentration of electrolyte (g/l)Ip(A)Ton (μs)DFAttractionRepulsionConcentration of electrolyte (g/l)Ip(A)Ton (μs)
151.203000.512.0923.51151.20300
151.203000.511.9123.74151.20300
151.203000.512.4423.95151.20300
151.354000.652.43127.99151.35400
151.354000.651.47128.19151.35400
151.354000.651.99129.68151.35400
151.505000.722.45103.00151.50500
151.505000.722.39103.34151.50500
151.505000.721.78103.98151.50500
22.51.204000.714.0531.2822.51.20400
22.51.204000.716.1235.2122.51.20400
22.51.204000.714.8833.6222.51.20400
22.51.355000.523.30107.7122.51.35500
22.51.355000.520.56110.1022.51.35500
22.51.355000.520.53106.0022.51.35500
22.51.503000.615.5137.7822.51.50300
22.51.503000.615.2336.3222.51.50300
22.51.503000.616.3435.6422.51.50300
301.205000.627.78110.54301.20500
301.205000.625.28107.33301.20500
301.205000.625.00107.12301.20500
301.353000.722.1855.34301.35300
301.353000.720.4653.08301.35300
301.353000.720.1351.27301.35300
301.504000.514.1833.51301.50400
301.504000.515.9733.52301.50400
301.504000.514.2832.43301.50400

[i] MRR, material removal rate; OC, overcut.

Fig. 5

Improvement in MRR and OC in presence of magnetic field when electrochemical micromachined Ti-6Al-4V. MRR, material removal rate; OC, overcut.

Fig. 6

EDS analysis of electrochemical micromachined Ti-6Al-4V hole profile: (A) without magnetic field and (B) with magnetic field. EDS, energy dispersive X-ray spectroscopy.

Fig. 7

Hole profile of electrochemical micromachined Ti-6Al-4V: (A) without and (B) with magnetic field.

Fig. 8

Atomic force microscopy of electrochemical micromachined Ti-6Al-4V hole profile: (A) without and (B) with magnetic field.

Table 8

Topographical analysis of electrochemical micromachined Ti-6Al-4V hole profile.

ECMM environmentHole surface roughness (nm)
No magnetic field159
Magnetic field71

[i] ECMM, electrochemical micromachining.

Table 9

Residual stress analysis of electrochemical micromachined Ti-6Al-4V hole profile.

No magnetic fieldMagnetic field
Residual stress values (MPa)259.62264.89
Fig. 9

XRD analysis of electrochemical micromachined Ti-6Al-4V hole profile: (A) Without and (B) With magnetic field. XRD, x-ray diffraction.

DOI: https://doi.org/10.2478/msp-2021-0013 | Journal eISSN: 2083-134X (formerly 2083-124X) | Journal ISSN: 2083-1331
Language: English
Page range: 124 - 138
Submitted on: Feb 25, 2021
Accepted on: May 3, 2021
Published on: Jul 9, 2021
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services

© 2021 T. Praveena Gopinath, J. Prasanna, C. Chandrasekhara Sastry, Sandeep Patil, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.