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Micro-structural and bonding structure analysis of TiAlN thin films deposited with varying N2 flow rate via ion beam sputtering technique Cover

Micro-structural and bonding structure analysis of TiAlN thin films deposited with varying N2 flow rate via ion beam sputtering technique

Materials Science-Poland
Volume 38 (2020): Issue 1 (March 2020)
By: Soham Das,  Mukul Gupta,  Ashis Sharma and  Bibhu P. Swain  
Open Access
|May 2020

Authors

Soham Das

Department of Mechanical Engineering, Sikkim Manipal Institute of Technology, Sikkim Manipal University, Rangpo, India

Mukul Gupta

UGC-DAE Consortium for Scientific Research, University Campus, Indore, India

Ashis Sharma

Department of Mechanical Engineering, Sikkim Manipal Institute of Technology, Sikkim Manipal University, Rangpo, India

Bibhu P. Swain

bibhuprasad.swain@gmail.com

Department of Physics, National Institute of Technology, India
DOI: https://doi.org/10.2478/msp-2020-0006 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 122 - 131
Submitted on: Oct 13, 2018
Accepted on: Apr 23, 2019
Published on: May 8, 2020
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
TiAlN,
GIXRD,
FE-SEM,
XANES
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2020 Soham Das, Mukul Gupta, Ashis Sharma, Bibhu P. Swain, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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