Micro-structural and bonding structure analysis of TiAlN thin films deposited with varying N2 flow rate via ion beam sputtering technique
By: Soham Das, Mukul Gupta, Ashis Sharma and Bibhu P. Swain
Authors
Soham Das
Department of Mechanical Engineering, Sikkim Manipal Institute of Technology, Sikkim Manipal University, Rangpo, India
Mukul Gupta
UGC-DAE Consortium for Scientific Research, University Campus, Indore, India
Ashis Sharma
Department of Mechanical Engineering, Sikkim Manipal Institute of Technology, Sikkim Manipal University, Rangpo, India
Bibhu P. Swain
Department of Physics, National Institute of Technology, India
Language: English
Page range: 122 - 131
Submitted on: Oct 13, 2018
Accepted on: Apr 23, 2019
Published on: May 8, 2020
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
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© 2020 Soham Das, Mukul Gupta, Ashis Sharma, Bibhu P. Swain, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.