SiN/SiO2 passivation stack of n-type silicon surface
By: A. El Amrani, R. Si-Kaddour, M. Maoudj and C. Nasraoui
Authors
A. El Amrani
Research Center in Semiconductor Technology for Energetic, Algiers, Algeria
R. Si-Kaddour
Research Center in Semiconductor Technology for Energetic, Algiers, Algeria
M. Maoudj
Research Center in Semiconductor Technology for Energetic, Algiers, Algeria
C. Nasraoui
Research Center in Semiconductor Technology for Energetic, Algiers, Algeria
Language: English
Page range: 482 - 487
Submitted on: Oct 28, 2018
Accepted on: Apr 23, 2019
Published on: Oct 18, 2019
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
Related subjects:
© 2019 A. El Amrani, R. Si-Kaddour, M. Maoudj, C. Nasraoui, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.