Have a personal or library account? Click to login
Inhomogeneous HfO2 layer growth at atomic layer deposition Cover

Inhomogeneous HfO2 layer growth at atomic layer deposition

Journal of Electrical Engineering
Volume 74 (2023): Issue 4 (August 2023)
By: Aarne Kasikov,  Aivar Tarre and  Guillermo Vinuesa  
Open Access
|Aug 2023

Metrics

DOI: https://doi.org/10.2478/jee-2023-0031 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
Journal RSS Feed
Language: English
Page range: 246 - 255
Submitted on: May 11, 2023
|
Published on: Aug 29, 2023
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
hafnium thin films,
spectroscopic ellipsometry,
growth inhomogeneity,
atomic layer deposition,
packing density,
resistive switching,
filament formation
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2023 Aarne Kasikov, Aivar Tarre, Guillermo Vinuesa, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Volume 74 (2023): Issue 4 (August 2023)Next article