Inhomogeneous HfO2 layer growth at atomic layer deposition
By: Aarne Kasikov, Aivar Tarre and Guillermo Vinuesa
Authors
Aivar Tarre
Institute of Physics, University of Tartu, Estonia
Guillermo Vinuesa
Department of Electronics, University of Valladolid, Spain
Language: English
Page range: 246 - 255
Submitted on: May 11, 2023
Published on: Aug 29, 2023
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
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© 2023 Aarne Kasikov, Aivar Tarre, Guillermo Vinuesa, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.