Have a personal or library account? Click to login
Optical properties of electrochemically etched N-type silicon wafers for solar cell applications Cover

Optical properties of electrochemically etched N-type silicon wafers for solar cell applications

Journal of Electrical Engineering
Volume 71 (2020): Issue 6 (December 2020)
By: Martin Králik,  Matej Goraus and  Emil Pinčík  
Open Access
|Dec 2020

Metrics

DOI: https://doi.org/10.2478/jee-2020-0055 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
Journal RSS Feed
Language: English
Page range: 406 - 412
Submitted on: Jul 2, 2020
Published on: Dec 24, 2020
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
electrochemical etching,
effective medium approximation,
Looyenga EMA,
modified Fresnel coefficients,
reflectivity,
Tauc-Lorentz dispersion model
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2020 Martin Králik, Matej Goraus, Emil Pinčík, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Previous articleVolume 71 (2020): Issue 6 (December 2020)Next article