Fabrication of nano-patterns of photoresist by ultraviolet lithography and oxygen plasma
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Metrics
Language: English
Page range: 359 - 364
Submitted on: Sep 16, 2020
Published on: Nov 26, 2020
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 times per year
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© 2020 E Cheng, Suzhou Tang, Helin Zou, Zhengyan Zhang, Yao Wang, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.