Fabrication of nano-patterns of photoresist by ultraviolet lithography and oxygen plasma
By:
Authors
E Cheng
School of Mechanical Engineering, Hebei University of Technology, PR China
Research Institute for Structure Technology of Advanced Equipment, Hebei University of Technology, PR China
Suzhou Tang
School of Economics and Management, Tianjin University of Science and Technology, China
Helin Zou
Key Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of Technology, Dalian, China
Zhengyan Zhang
School of Mechanical Engineering, Hebei University of Technology, PR China
Yao Wang
School of Mechanical Engineering, Hebei University of Technology, PR China
Research Institute for Structure Technology of Advanced Equipment, Hebei University of Technology, PR China
Language: English
Page range: 359 - 364
Submitted on: Sep 16, 2020
Published on: Nov 26, 2020
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 times per year
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© 2020 E Cheng, Suzhou Tang, Helin Zou, Zhengyan Zhang, Yao Wang, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.