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A study of properties of ZrO2 thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application Cover

A study of properties of ZrO2 thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application

Journal of Electrical Engineering
Volume 70 (2019): Issue 7 (December 2019)
By: Hind Zegtouf,  Nadia Saoula,  Mourad Azibi,  Larbi Bait,  Noureddine Madaoui,  Mohamed Redha Khelladi and  Mohamed Kechouane  
Open Access
|Sep 2019

Authors

Hind Zegtouf

Laboratoire Physique des Matériaux, Faculté de Physique, USTHB, Algiers, Algeria

Nadia Saoula

nsaoula@cdta.dz

Division Milieux Ionisés et Lasers, Centre de Développement des Technologies Avancées, CDTA, Algiers, Algeria

Mourad Azibi

Division Milieux Ionisés et Lasers, Centre de Développement des Technologies Avancées, CDTA, Algiers, Algeria

Larbi Bait

Division Milieux Ionisés et Lasers, Centre de Développement des Technologies Avancées, CDTA, Algiers, Algeria

Noureddine Madaoui

Division Milieux Ionisés et Lasers, Centre de Développement des Technologies Avancées, CDTA, Algiers, Algeria

Mohamed Redha Khelladi

Laboratoire de Chimie, Université Ferhat Abbas-Sétif 1, Sétif, Algeria

Mohamed Kechouane

Laboratoire Physique des Matériaux, Faculté de Physique, USTHB, Algiers, Algeria
DOI: https://doi.org/10.2478/jee-2019-0052 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
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Language: English
Page range: 117 - 121
Submitted on: Mar 19, 2019
|
Published on: Sep 28, 2019
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
ZrO2,
magnetron sputtering,
thin films,
hardness,
corrosion
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2019 Hind Zegtouf, Nadia Saoula, Mourad Azibi, Larbi Bait, Noureddine Madaoui, Mohamed Redha Khelladi, Mohamed Kechouane, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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