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Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films Cover

Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films

Journal of Electrical Engineering
Volume 70 (2019): Issue 7 (December 2019)
By: Ivan Ohlídal,  Jiří Vohánka,  Daniel Franta,  Martin Čermák,  Jaroslav Ženíšek and  Petr Vašina  
Open Access
|Sep 2019

Authors

Ivan Ohlídal

ohlidal@sci.muni.cz

Department of Physical Electronic, Faculty of Science, Masaryk University, Brno

Jiří Vohánka

Department of Physical Electronic, Faculty of Science, Masaryk University, Brno

Daniel Franta

Department of Physical Electronic, Faculty of Science, Masaryk University, Brno

Martin Čermák

Department of Physical Electronic, Faculty of Science, Masaryk University, Brno

Jaroslav Ženíšek

Department of Physical Electronic, Faculty of Science, Masaryk University, Brno

Petr Vašina

Department of Physical Electronic, Faculty of Science, Masaryk University, Brno
DOI: https://doi.org/10.2478/jee-2019-0037 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
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Language: English
Page range: 16 - 26
Submitted on: Mar 19, 2019
|
Published on: Sep 28, 2019
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
reflectance,
ellipsometric parameters,
inhomogeneous thin films,
optical characterization
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2019 Ivan Ohlídal, Jiří Vohánka, Daniel Franta, Martin Čermák, Jaroslav Ženíšek, Petr Vašina, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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