Have a personal or library account? Click to login
Modeling reactive magnetron sputtering: a survey of different modeling approaches Cover

Modeling reactive magnetron sputtering: a survey of different modeling approaches

Acta Universitatis Sapientiae, Informatica
Volume 12 (2020): Issue 1 (July 2020)
By: Rossi Róbert Madarász,  András Kelemen and  Péter Kádár  
Open Access
|Jul 2020

References

  1. [1] T. Abe,T. Yamashina. The deposition rate of metallic thin films in the reactive sputtering process. Thin Solid Films, 30, 1 (1975) 19–27. ⇒12010.1016/0040-6090(75)90300-4
    Search in Google ScholarBack to article
  2. [2] Z. Ahmad, B. Abdallah. Controllability analysis of reactive magnetron sputtering process. Acta Physica Polonica, A., 123, 1 2013. ⇒12710.12693/APhysPolA.123.3
    Search in Google ScholarBack to article
  3. [3] S. Berg, H.-O. Blom, T. Larsson, C. Nender. Modeling of reactive sputtering of compound materials. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 5, 2 (1987) 202–207. ⇒120, 12410.1116/1.574104
    Search in Google ScholarBack to article
  4. [4] S. Berg, C. Nender. Modeling of mass transport and gas kinetics of the reactive sputtering process. Le Journal de Physique IV, 5 (C5):C5–45, 1995. ⇒120, 12410.1051/jphyscol:1995502
    Search in Google ScholarBack to article
  5. [5] S. Berg, T. Nyberg, H.-O. Blom, C. Nender. Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 16, 3 (1998) 1277–1285. ⇒120 122, 123 12410.1116/1.581274
    Search in Google ScholarBack to article
  6. [6] S. Berg, T. Nyberg. Fundamental understanding and modeling of reactive sputtering processes. Thin solid films, 476, 2 (2005) 215–230. ⇒11710.1016/j.tsf.2004.10.051
    Search in Google ScholarBack to article
  7. [7] M.-M.-M. Bilek, D.-R. McKenzie. Predicting the structure of plasma deposited materials. Czechoslovak Journal of Physics52 (2002) 905–920. ⇒119
    Search in Google ScholarBack to article
  8. [8] C.-K. Birdsall, A.-B. Langdon. Plasma Physics Via Computer Simulation, Bristol, UK. IOP Publishing, 1991. ⇒11610.1887/0750301171
    Search in Google ScholarBack to article
  9. [9] A. Bogaerts, M. van Straaten, R. Gijbels. Monte Carlo simulation of an analytical glow discharge: motion of electrons, ions and fast neutrals in the cathode dark space. Spectrochimica Acta Part B: Atomic Spectroscopy, 50, 2 (1995) 179–196. ⇒115, 11610.1016/0584-8547(94)00117-E
    Search in Google ScholarBack to article
  10. [10] A. Bogaerts, R. Gijbels, W.-J. Goedheer. Hybrid Monte Carlo-fluid model of a direct current glow discharge. Journal of Applied Physics, 78, 4 (1995) 2233–2241. ⇒11610.1063/1.360139
    Search in Google ScholarBack to article
  11. [11] A. Bogaerts, M. van Straaten, R. Gijbels. Description of the thermalization process of the sputtered atoms in a glow discharge using a three-dimensional Monte Carlo method. Journal of applied physics, 77, 5 (1995) 1868–1874. ⇒11610.1063/1.358887
    Search in Google ScholarBack to article
  12. [12] A. Bogaerts, R. Gijbels, W.-J. Goedheer. Two-dimensional model of a direct current glow discharge: Description of the electrons, argon ions, and fast argon atoms. Analytical Chemistry, 68, 14 (1996) 2296–2303. ⇒11610.1021/ac9510651
    Search in Google ScholarBack to article
  13. [13] A. Bogaerts, J. Naylor, M. Hatcher, W.-J. Jones, R. Mason. Influence of sticking coe cients on the behavior of sputtered atoms in an argon glow discharge: Modeling and comparison with experiment. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 16, 4 (1998) 2400–2410. ⇒12310.1116/1.581359
    Search in Google ScholarBack to article
  14. [14] J.-W. Bradley. The plasma properties adjacent to the target in a magnetron sputtering source. Plasma sources science and technology, 5, 4 (1996) 622. ⇒11610.1088/0963-0252/5/4/003
    Search in Google ScholarBack to article
  15. [15] P. Carlsson, C. Nender, H. Barankova, S. Berg. Reactive sputtering using two reactive gases, experiments and computer modeling. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 11, 4 (1993) 1534–1539. ⇒122, 12510.1116/1.578501
    Search in Google ScholarBack to article
  16. [16] J.-M. Chappé, N. Martin, J. Lintymer, F. Sthal, G. Terwagne, J. Takadoum. Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process. Applied Surface Science, 253, 12 (2007) 5312–5316. ⇒128
    Search in Google ScholarBack to article
  17. [17] D.-J. Christie, W.-D. Sproul, D. Carter. Mid-frequency dual magnetron reactive co-sputtering for deposition of customized index optical films. In Society of Vacuum Coaters 46 th Annual Technical Conference, 2003 pp. 393–398. ⇒125
    Search in Google ScholarBack to article
  18. [18] D.-J. Christie. Power conversion and control for pulsed magnetron reactive sputtering. PhD thesis, Colorado State University, 2004. ⇒125
    Search in Google ScholarBack to article
  19. [19] D.-J. Christie. Making magnetron sputtering work: Modelling reactive sputtering dynamics, part 1. SVC Bulletin, 2014. pp. 24–27. ⇒127
    Search in Google ScholarBack to article
  20. [20] D.-J. Christie. Making magnetron sputtering work: Modelling reactive sputtering dynamics, part 2. SVC Bulletin, 2015, pp. 30–33. ⇒127
    Search in Google ScholarBack to article
  21. [21] D.-J. Christie. Making magnetron sputtering work: Modelling reactive sputtering dynamics, part 3. SVC Bulletin, 2015, pp. 38–41. ⇒127
    Search in Google ScholarBack to article
  22. [22] C. Costin, L. Marques, G. Popa, G. Gousset. Two-dimensional fluid approach to the dc magnetron discharge. Plasma Sources Science and Technology, 14, 1 (2005) 168. ⇒116
    Search in Google ScholarBack to article
  23. [23] N.-F. Cramer. Analysis of a one-dimensional, steady-state magnetron discharge. Journal of Physics D: Applied Physics, 30, 18 (1997) 2573. ⇒11610.1088/0022-3727/30/18/012
    Search in Google ScholarBack to article
  24. [24] D. Depla, J. Haemers, G. Buyle, R. De Gryse. Hysteresis behavior during reactive magnetron sputtering of Al2O3 using a rotating cylindrical magnetron. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 24, 4 (2006) 934–938. ⇒12710.1116/1.2198870
    Search in Google ScholarBack to article
  25. [25] D. Depla, S. Heirwegh, S. Mahieu, R. De Gryse. Towards a more complete model for reactive magnetron sputtering. Journal of Physics D: Applied Physics, 40, 7 (2007) 1957. ⇒117
    Search in Google ScholarBack to article
  26. [26] D. Depla, S. Mahieu, et al. Reactive Sputter Deposition, volume 109. Springer, 2008. ⇒116, 117, 12110.1007/978-3-540-76664-3
    Search in Google ScholarBack to article
  27. [27] D. Depla, X.-Y. Li, S. Mahieu, K.-V. Aeken, W.-P. Leroy, J. Haemers, R. De Gryse, A. Bogaerts. Rotating cylindrical magnetron sputtering: Simulation of the reactive process. Journal of Applied Physics, 107, 11 (2010) 113307. ⇒117, 12710.1063/1.3415550
    Search in Google ScholarBack to article
  28. [28] D. Depla, K. Strijckmans, A. Dulmaa, F. Cougnon, R. Dedoncker, R. Schelfhout, I. Schramm, F. Moens, R. De Gryse. Modeling reactive magnetron sputtering: Opportunities and challenges. Thin Solid Films, 2019. ⇒13110.1016/j.tsf.2019.05.045
    Search in Google ScholarBack to article
  29. [29] J. Goree, T.-E. Sheridan. Magnetic field dependence of sputtering magnetron efficiency. Applied physics letters, 59, 9 (1991) 1052–1054. ⇒11610.1063/1.106342
    Search in Google ScholarBack to article
  30. [30] T. Hammerschmidt, A. Kersch, P. Vogl. Embedded atom simulations of titanium systems with grain boundaries. Physical Review B, 71, 20 (2005) 205409. ⇒11810.1103/PhysRevB.71.205409
    Search in Google ScholarBack to article
  31. [31] J. Heller. Reactive sputtering of metals in oxidizing atmospheres. Thin Solid Films, 17, 2 (1973) 163–176. ⇒12010.1016/0040-6090(73)90125-9
    Search in Google ScholarBack to article
  32. [32] M.-A. Karolewski. Kalypso: a software package for molecular dynamics simulation of atomic collisions at surfaces. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 230, 1-4 (2005) 402–405. ⇒11710.1016/j.nimb.2004.12.074
    Search in Google ScholarBack to article
  33. [33] A. Kelemen, D. Biró, A.-Zs. Fekete, L. Jakab-Farkas, R.-R. Madarász. Macroscopic thin film deposition model for the two-reactive-gas sputtering process. Acta Universitatis Sapientiae Electrical and Mechanical Engineering, 8 (2016) 62–78. ⇒125, 12710.1515/auseme-2017-0005
    Search in Google ScholarBack to article
  34. [34] S. Kikkawa, M. Fujiki, M. Takahashi, and F. Kanamaru. Reactive co-sputter deposition and succesive annealing of fe-al-n thin film. Journal of the Japan Society of Powder and Powder Metallurgy, 44, 7 (1997) 674–677. ⇒12510.2497/jjspm.44.674
    Search in Google ScholarBack to article
  35. [35] R.-L. Kinder, M.-J. Kushner. Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sources. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 19, 1 (2001) 76–86. ⇒11610.1116/1.1329122
    Search in Google ScholarBack to article
  36. [36] T. Kubart, O. Kappertz, T. Nyberg, S. Berg. Dynamic behaviour of the reactive sputtering process. Thin Solid Films, 515, 2 (2006) 421–424. ⇒11710.1016/j.tsf.2005.12.250
    Search in Google ScholarBack to article
  37. [37] W.-P. Leroy, S. Mahieu, R. Persoons, D. Depla. Method to determine the sticking coe cient of o2 on deposited al during reactive magnetron sputtering, using mass spectrometry. Plasma Processes and Polymers, 51, 6 (2009) S342–S346. ⇒12410.1002/ppap.200932401
    Search in Google ScholarBack to article
  38. [38] W.-P. Leroy, S. Mahieu, R. Persoons, D. Depla. Quantification of the incorporation coe cient of a reactive gas on a metallic film during magnetron sputtering: The method and results. Thin Solid Films, 518, 5 (2009) 1527–1531. ⇒12410.1016/j.tsf.2009.07.190
    Search in Google ScholarBack to article
  39. [39] W.-P. Leroy, S. Mahieu, D. Depla, A.-P. Ehiasarian. High power impulse magnetron sputtering using a rotating cylindrical magnetron. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 28, 1 (2010) 108–111. ⇒12710.1116/1.3271136
    Search in Google ScholarBack to article
  40. [40] R.-R. Madarász and A. Kelemen. Stoichiometry control of the two gas reactive sputtering process. In 2019 IEEE 19th International Symposium on Computational Intelligence and Informatics and 7th IEEE International Conference on Recent Achievements in Mechatronics, Automation, Computer Sciences and Robotics (CINTI-MACRo), pp. 000217–000222. IEEE, 2019. ⇒128, 129, 13010.1109/CINTI-MACRo49179.2019.9105135
    Search in Google ScholarBack to article
  41. [41] N. Martin, R. Sanjines, J. Takadoum, F. Lévy. Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique. Surface and Coatings Technology, 142 (2001) 615–620. ⇒12810.1016/S0257-8972(01)01149-5
    Search in Google ScholarBack to article
  42. [42] H.-E. McKelvey. Rotatable sputtering apparatus, May 1 1984. US Patent 4,445,997. ⇒127
    Search in Google ScholarBack to article
  43. [43] C. Misiano and E. Simonetti. 4.4 co-sputtered optical films. Vacuum, 27, 4 (1977) 403–406. ⇒12510.1016/0042-207X(77)90031-8
    Search in Google ScholarBack to article
  44. [44] W. Möller, W. Eckstein, J.-P. Biersack. Tridyn-binary collision simulation of atomic collisions and dynamic composition changes in solids. Computer Physics Communications, 51, 3 (1988) 355–368. ⇒11710.1016/0010-4655(88)90148-8
    Search in Google ScholarBack to article
  45. [45] W. Möller, M. Posselt. TRIDYN FZR User Manual. FZR Dresden, 2001. ⇒117
    Search in Google ScholarBack to article
  46. [46] M. Moradi, C. Nender, S. Berg, H.-O. Blom, A. Belkind, Z. Orban. Modeling of multicomponent reactive sputtering. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 9, 3 (1991) 619–624. ⇒12510.1116/1.577376
    Search in Google ScholarBack to article
  47. [47] E. Penilla, J. Wang. Pressure and temperature effects on stoichiometry and microstructure of nitrogen-rich tin thin films synthesized via reactive magnetron dc-sputtering. Journal of Nanomaterials, 2008. ⇒11810.1155/2008/267161
    Search in Google ScholarBack to article
  48. [48] L.-M. Popescu. A computer code package for Monte Carlo photon-electron transport simulation: Comparisons with experimental benchmarks. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 161 (2000) 318–322. ⇒11710.1016/S0168-583X(99)00984-2
    Search in Google ScholarBack to article
  49. [49] I.-A. Porokhova, Y.-B. Golubovskii, J. Bretagne, M. Tichy, J.-F. Behnke. Kinetic simulation model of magnetron discharges. Physical Review E, 63, 5 (2001) 056408. ⇒116
    Search in Google ScholarBack to article
  50. [50] I.A. Porokhova, Y.-B. Golubovskii, J.-F. Behnke. Anisotropy of the electron component in a cylindrical magnetron discharge. i. theory of the multiterm analysis. Physical Review E, 71, 6 (2005) 066406. ⇒116
    Search in Google ScholarBack to article
  51. [51] I.-A. Porokhova, Y.-B. Golubovskii, J.-F. Behnke. Anisotropy of the electron component in a cylindrical magnetron discharge. ii. application to real magnetron discharge. Physical review E, 71, 6 (2005) 066407. ⇒11610.1103/PhysRevE.71.06640716089880
    Search in Google ScholarBack to article
  52. [52] R.-K. Porteous, D.-B. Graves. Modeling and simulation of magnetically confined low-pressure plasmas in two dimensions. IEEE transactions on plasma science, 19, 2 (1991) 204–213. ⇒11610.1109/27.106815
    Search in Google ScholarBack to article
  53. [53] T.-E. Sheridan, M.-J. Goeckner, J. Goree. Model of energetic electron transport in magnetron discharges. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 8, 1 (1990) 30–37. ⇒11610.1116/1.577093
    Search in Google ScholarBack to article
  54. [54] F. Shinoki, A. Itoh. Mechanism of rf reactive sputtering. Journal of Applied Physics, 46, 8 (1975) 3381–3384. ⇒12010.1063/1.322242
    Search in Google ScholarBack to article
  55. [55] W.-D. Sproul, D.-J. Christie, D.-C. Carter. Control of reactive sputtering processes. Thin solid films, 491, 1-2 (2005) 1–17. ⇒12510.1016/j.tsf.2005.05.022
    Search in Google ScholarBack to article
  56. [56] K. Strijckmans, W.-P. Leroy, R. De Gryse, D. Depla. Modeling reactive magnetron sputtering: Fixing the parameter set. Surface and Coatings Technology, 206, 17 (2012) 3666–3675. ⇒117, 12410.1016/j.surfcoat.2012.03.019
    Search in Google ScholarBack to article
  57. [57] K. Strijckmans and D. Depla. A time-dependent model for reactive sputter deposition. Journal of Physics D: Applied Physics, 37, 23 (2014) 235302. ⇒117, 127
    Search in Google ScholarBack to article
  58. [58] K. Strijckmans. Modeling the reactive magnetron sputtering process. PhD Thesis, Ghent University, 2015. ⇒114, 123, 125, 126
    Search in Google ScholarBack to article
  59. [59] R. Terry, K. Gibbons, S. Zarrabian. Method and apparatus for reactive sputtering employing two control loops, August 22 2000. US Patent 6,106,676. ⇒127
    Search in Google ScholarBack to article
  60. [60] A.-E. Wendt, M.-A. Lieberman, H. Meuth. Radial current distribution at a plan ar magnetron cathode. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 6, 3 (1988) 1827–1831. ⇒11610.1116/1.575263
    Search in Google ScholarBack to article
  61. [61] A.-E. Wendt, M.-A. Lieberman. Spatial structure of a planar magnetron discharge. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 8, 2 (1990) 902–907. ⇒11610.1116/1.576894
    Search in Google ScholarBack to article
  62. [62] C. Woelfel, P. Awakowicz, J. Lunze. Model reduction and identification of nonlinear reactive sputter processes. IFAC-PapersOnLine, 50, 1 (2017) 13728–13734. ⇒115, 127, 128, 12910.1016/j.ifacol.2017.08.2553
    Search in Google ScholarBack to article
  63. [63] C. Woelfel, P. Awakowicz, J. Lunze. Robust high-gain control of nonlinear reactive sputter processes. In 2017 IEEE Conference on Control Technology and Applications (CCTA), IEEE, 2017, pp 25–30. ⇒12810.1109/CCTA.2017.8062435
    Search in Google ScholarBack to article
  64. [64] C. Woelfel, P. Awakowicz, J. Lunze. Tuning rule for linear control of nonlinear reactive sputter processes. In 2017 21st International Conference on Process Control (PC), IEEE, 2017, pp. 109–114. ⇒12810.1109/PC.2017.7976198
    Search in Google ScholarBack to article
  65. [65] C. Woelfel, S. Kockmann, P. Awakowicz, J. Lunze. Model identification of nonlinear sputter processes. In 2017 17th International Conference on Control, Automation and Systems (ICCAS), IEEE, 2017, pp. 182–187. ⇒12810.23919/ICCAS.2017.8204438
    Search in Google ScholarBack to article
  66. [66] C. Woelfel, S. Kockmann, P. Awakowicz, J. Lunze. Neural network based linearization and control of sputter processes. In 2017 11th Asian Control Conference (ASCC), IEEE, 2017, pp. 2831–2836. ⇒12810.1109/ASCC.2017.8287626
    Search in Google ScholarBack to article
  67. [67] C. Woelfel, D. Bockhorn, P. Awakowicz, J. Lunze. Model approximation and stabilization of reactive sputter processes. Journal of Process Control, 2018. ⇒128, 13110.1016/j.jprocont.2018.06.009
    Search in Google ScholarBack to article
  68. [68] Y. Yamamura and M. Ishida. Monte Carlo simulation of the thermalization of sputtered atoms and reflected atoms in the magnetron sputtering discharge. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 13, 1 (1995) 101–112. ⇒11710.1116/1.579874
    Search in Google ScholarBack to article
DOI: https://doi.org/10.2478/ausi-2020-0008 | Journal eISSN: 2066-7760
Journal RSS Feed
Language: English
Page range: 112 - 136
Submitted on: May 3, 2020
|
Accepted on: Jun 8, 2020
|
Published on: Jul 16, 2020
Published by: Sapientia Hungarian University of Transylvania
In partnership with: Paradigm Publishing Services
Publication frequency: 2 issues per year
Keywords:
mathematical modeling,
parameter identification,
control theory,
computer simulation,
reactive magnetron sputtering
Related subjects:
Computer sciences,
Computer sciences, other

© 2020 Rossi Róbert Madarász, András Kelemen, Péter Kádár, published by Sapientia Hungarian University of Transylvania
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Previous articleVolume 12 (2020): Issue 1 (July 2020)Next article