Figure 1.
Testing of aluminum alloy samples Al6061-T6
Figure 2.
CRYO vacuum chamber and plasma generation principle
Figure 3.
Langmuir probe and samples inside the chamber
Table 1.
Calculated values of the plasma parameters
| Parameters | Calculated values |
|---|---|
| Floating potential | 7.5 V |
| Electron saturation current | 19 × 10−5A |
| Electron temperature (Te) | 3 eV |
| Electron density (ne) | 4.47 × 106/cm3 |
| Debye length λD | λD (cm) ≈ 0.61 (cm) |
Figure 4.
The behavior of arc current in samples subjected to a 1-h biasing voltage
Figure 5.
Behavior of the potential waveform in samples subjected to a biasing voltage for 1 h
Figure 6.
Arc current behavior in samples subjected to a 2-h biasing voltage
Figure 7.
The behavior of the potential waveform in samples exposed to a biasing voltage for 2 h
Figure 8.
UV/Vis absorption spectra for a sample with a coating thickness of 25 μm
Figure 9.
UV/Vis absorption spectra for a sample with a coating thickness of 45 μm
Figure 10.
Reflectance of the 25-μm-thick sample
Figure 11.
Reflectance of the 25-μm-thick sample
Figure 12.
Peak values for the two samples at various times of plasma exposure in the absorption case
Figure 13.
Peak values for the two samples at various plasma exposure times in the reflectance case
Table 2.
Maximum absorbance and reflectance values for the two samples
| Condition | 45 μm | 25 μm | ||
|---|---|---|---|---|
| Abs (max) | Ref (max) | Abs (max) | Ref (max) | |
| Without the plasma effect | 1.18935 | 50.4173 | 1.451 | 66.9496 |
| Plasma exposure (1 h) | 1.4533 | 51.9398 | 1.532 | 67.1468 |
| Plasma exposure (2 h) | 1.35128 | 51.962 | 1.486 | 71.105 |
Figure 14.
EDX analysis of the 45-μm-thick sample before plasma exposure
Figure 15.
EDX analysis of the 45-μm-thick sample after 1 h of plasma exposure
Figure 16.
EDX analysis of the 45-μm-thick sample after 2 h of plasma exposure
Table 3.
Quantitative analysis of the sample excluding plasma effects
| Element | Weight ℅ | Atomic % |
|---|---|---|
| CK | 16.73 | 19.98 |
| OK | 45.72 | 50.16 |
| Al K | 32.27 | 27.78 |
| Si K | 0.51 | 0.23 |
| S K | 4.77 | 1.85 |
| Total | 100 | 100 |
Table 4.
Quantitative analysis of the sample after 1 h of plasma exposure
| Element | Weight ℅ | Atomic % |
|---|---|---|
| CK | 13.23 | 16.28 |
| OK | 42.63 | 46.06 |
| Al K | 39.39 | 36.16 |
| Si K | 0.33 | 0.15 |
| S K | 4.42 | 1.35 |
| Total | 100 | 100 |