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Quantitative analysis of the sample after 1 h of plasma exposure
| Element | Weight ℅ | Atomic % |
|---|---|---|
| CK | 13.23 | 16.28 |
| OK | 42.63 | 46.06 |
| Al K | 39.39 | 36.16 |
| Si K | 0.33 | 0.15 |
| S K | 4.42 | 1.35 |
| Total | 100 | 100 |
Calculated values of the plasma parameters
| Parameters | Calculated values |
|---|---|
| Floating potential | 7.5 V |
| Electron saturation current | 19 × 10−5A |
| Electron temperature (Te) | 3 eV |
| Electron density (ne) | 4.47 × 106/cm3 |
| Debye length λD | λD (cm) ≈ 0.61 (cm) |
Maximum absorbance and reflectance values for the two samples
| Condition | 45 μm | 25 μm | ||
|---|---|---|---|---|
| Abs (max) | Ref (max) | Abs (max) | Ref (max) | |
| Without the plasma effect | 1.18935 | 50.4173 | 1.451 | 66.9496 |
| Plasma exposure (1 h) | 1.4533 | 51.9398 | 1.532 | 67.1468 |
| Plasma exposure (2 h) | 1.35128 | 51.962 | 1.486 | 71.105 |
Quantitative analysis of the sample with 2 h of plasma exposure
| Element | Weight ℅ | Atomic % |
|---|---|---|
| CK | 12.86 | 15.81 |
| OK | 40.79 | 44.09 |
| Al K | 41.63 | 38.57 |
| Si K | 0.48 | 0.22 |
| S K | 4.24 | 1.31 |
| Total | 100 | 100 |
Quantitative analysis of the sample excluding plasma effects
| Element | Weight ℅ | Atomic % |
|---|---|---|
| CK | 16.73 | 19.98 |
| OK | 45.72 | 50.16 |
| Al K | 32.27 | 27.78 |
| Si K | 0.51 | 0.23 |
| S K | 4.77 | 1.85 |
| Total | 100 | 100 |
Average surface roughness values for the two samples
| Condition | Surface roughness (μm) | |
|---|---|---|
| Sample with a thickness of 45 μm | Sample with a thickness of 25 μm | |
| Without plasma effect | 1.8178 | 1.831 |
| With plasma exposure (2 h) | 1.2291 | 1.5157 |