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Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition Cover

Influence of substrate temperature and gas pressure on aluminum oxynitride coatings obtained by pulsed laser deposition

Open Access
|Feb 2017

Figures & Tables

AFM images of surface topography (20 μm × 20 μm) of coatings obtained at different substrate temperatures.
Roughness of coatings obtained at different substrate temperatures.
Thickness of coatings obtained at different substrate temperatures.
Hardness of coatings obtained at different substrate temperatures.
Young’s modulus of coatings obtained at different substrate temperatures.
Surface topography (20 μm × 20 μm) of coatings obtained at various deposition pressures; (a) to (c) is AFM; (d) is optical microscopy, and (e) is SEM.
Roughness of coatings obtained at various deposition pressures.
Thickness of coating obtained at various deposition pressures.
Hardness of coatings obtained at various deposition pressures.
Oxygen and nitrogen concentrations (a) and N + O:Al ratio (b) in coatings obtained at different temperatures; EDS and WDS.
Oxygen and nitrogen concentration (a), and N + O:Al ratio (b) in coatings obtained at different pressures; EDS and WDS.
Oxygen and nitrogen concentration (a), and N + O:Al ratio (b) in coatings obtained at different atmosphere compositions (based on the results presented in the literature [17]); EDS and WDS.
DOI: https://doi.org/10.1515/msp-2017-0033 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 254 - 264
Submitted on: Oct 16, 2016
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Accepted on: Jan 22, 2017
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Published on: Feb 24, 2017
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2017 Joanna Piwowarczyk, Roman Jędrzejewski, Jolanta Baranowska, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.