Investigation of optical properties of silicon oxynitride films deposited by RF PECVD method
Authors
Waldemar Oleszkiewicz
Poland
Adrian Zakrzewski
Poland
Sergiusz Patela
Poland
Marek Tłaczała
Poland
DOI: https://doi.org/10.1515/msp-2016-0111 | Journal eISSN: 2083-134X (formerly 2083-124X) | Journal ISSN: 2083-1331
Language: English
Page range: 868 - 871
Submitted on: Apr 20, 2016
Accepted on: Sep 26, 2016
Published on: Nov 27, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Related subjects:
© 2016 Wojciech Kijaszek, Waldemar Oleszkiewicz, Adrian Zakrzewski, Sergiusz Patela, Marek Tłaczała, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.