





Structural properties of TiO2 thin films determined based on the results of XRD_
| Thin film | Process | Phase | Crystal plane | D [nm] | d [nm] | dPDF [nm] | Δd (%) | PDF card |
|---|---|---|---|---|---|---|---|---|
| TiO2 | low-pressure | anatase | (1 0 1) | 19.9 | 0.3519 | 0.3520 [24] | −0.03 | 21-1272 [24] |
| TiO2 | high-energy | rutile | (1 1 0) | 4.6 | 0.3240 | 0.3247 [25] | −0.21 | 21-1276 [25] |