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Optimization of S:Sn precursor molar concentration on the physical properties of spray deposited single phase Sn2S3 thin films

Materials Science-Poland
Volume 34 (2016): Issue 2 (June 2016)
By:
Open Access
|Jun 2016

Figures & Tables

Fig. 1

XRD patterns of Sn2S3 thin films prepared with (a) 0.01:0.01, (b) 0.02:0.02, (c) 0.03:0.03 and (d) 0.04:0.04 S:Sn precursor molar concentrations.
XRD patterns of Sn2S3 thin films prepared with (a) 0.01:0.01, (b) 0.02:0.02, (c) 0.03:0.03 and (d) 0.04:0.04 S:Sn precursor molar concentrations.

Fig. 2

SEM images of Sn2S3 thin films prepared with (a) 0.01:0.01, (b) 0.02:0.02, (c) 0.03:0.03 and (d) 0.04:0.04 S:Sn precursor molar concentrations.
SEM images of Sn2S3 thin films prepared with (a) 0.01:0.01, (b) 0.02:0.02, (c) 0.03:0.03 and (d) 0.04:0.04 S:Sn precursor molar concentrations.

Fig. 3

Transmittance spectra of Sn2S3 thin films.
Transmittance spectra of Sn2S3 thin films.

Fig. 4

Tauc’s plots of Sn2S3 thin films.
Tauc’s plots of Sn2S3 thin films.

Fig. 5

PL spectra of Sn2S3 thin films coated with 0.01:0.01 and 0.02:0.02 S:Sn precursor molar concentrations.
PL spectra of Sn2S3 thin films coated with 0.01:0.01 and 0.02:0.02 S:Sn precursor molar concentrations.

Thickness, structural parameters and electrical resistivity values of Sn2S3 thin films prepared from solutions having different S:Sn precursor molar concentrations_

S:Sn precursorThicknessd(211)Dε × 10−4δ × 10−14Lattice parameters [Å]ρ
molar concentrationt [nm][Å][nm] [lines/m2]abc[Ω·cm]
0.01:0.01902.809945.90.7554.748915.5545.6205.6590.238
0.02:0.021222.8115560.6193.193115.5635.6235.6620.359
0.03:0.031762.8136420.8265.677315.5755.6275.6661.095
0.04:0.042062.823135.61.0328.870915.6275.6465.6856.38
DOI: https://doi.org/10.1515/msp-2016-0035 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 393 - 398
Submitted on: Oct 30, 2015
Accepted on: Jan 15, 2016
Published on: Jun 10, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
XRD,
scanning electron microscopy,
optical band gap,
thin films
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 J. Srivind, V.S. Nagarethinam, A.R. Balu, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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