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Controlled fluoridation of amorphous carbon films deposited at reactive plasma conditions Cover

Controlled fluoridation of amorphous carbon films deposited at reactive plasma conditions

Materials Science-Poland
Volume 33 (2015): Issue 3 (September 2015)
By: ,  ,   and    
Open Access
|Aug 2016
References

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DOI: https://doi.org/10.1515/msp-2015-0088 | Journal eISSN: 2083-134X (formerly 2083-124X) | Journal ISSN: 2083-1331
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Language: English
Page range: 606 - 611
Submitted on: Jan 13, 2014
Accepted on: May 31, 2015
Published on: Aug 30, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Keywords:
carbon deposition,
reactive plasma,
fluoridation
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 Alexander Yoffe, Ilya Zon, Yishay Feldman, Victor Shelukhin, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Volume 33 (2015): Issue 3 (September 2015)
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