Have a personal or library account? Click to login
Controlled fluoridation of amorphous carbon films deposited at reactive plasma conditions Cover

Controlled fluoridation of amorphous carbon films deposited at reactive plasma conditions

Materials Science-Poland
Volume 33 (2015): Issue 3 (September 2015)
By: Alexander Yoffe,  Ilya Zon,  Yishay Feldman and  Victor Shelukhin  
Open Access
|Aug 2016

Download Article

Download the full article as a PDF file.

DOI: https://doi.org/10.1515/msp-2015-0088 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Journal RSS Feed
Language: English
Page range: 606 - 611
Submitted on: Jan 13, 2014
Accepted on: May 31, 2015
Published on: Aug 30, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
carbon deposition,
reactive plasma,
fluoridation
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 Alexander Yoffe, Ilya Zon, Yishay Feldman, Victor Shelukhin, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Previous articleVolume 33 (2015): Issue 3 (September 2015)Next article