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Multifractal characteristics of titanium nitride thin films Cover

Multifractal characteristics of titanium nitride thin films

Materials Science-Poland
Volume 33 (2015): Issue 3 (September 2015)
By: Ştefan Ţălu,  Sebastian Stach,  Shahoo Valedbagi,  Reza Bavadi,  S. Mohammad Elahi and  Mihai Ţălu  
Open Access
|Aug 2016

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DOI: https://doi.org/10.1515/msp-2015-0086 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 541 - 548
Published on: Aug 30, 2016
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
atomic force microscopy,
DC magnetron sputtering,
multifractal analysis,
surface roughness,
titanium nitride (TiN) thin film
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 Ştefan Ţălu, Sebastian Stach, Shahoo Valedbagi, Reza Bavadi, S. Mohammad Elahi, Mihai Ţălu, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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