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Multifractal characteristics of titanium nitride thin films

Materials Science-Poland

Volume 33 (2015): Issue 3 (September 2015)

By: Ştefan Ţălu, Sebastian Stach, Shahoo Valedbagi, Reza Bavadi, S. Mohammad Elahi and Mihai Ţălu

Open Access

|Aug 2016

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DOI: https://doi.org/10.1515/msp-2015-0086 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331

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Language: English

Page range: 541 - 548

Published on: Aug 30, 2016

Published by: Wroclaw University of Science and Technology

In partnership with: Paradigm Publishing Services

Publication frequency: 4 issues per year

Keywords:

atomic force microscopy,

DC magnetron sputtering,

multifractal analysis,

surface roughness,

titanium nitride (TiN) thin film

Related subjects:

Materials sciences,

Materials sciences, other,

Functional and smart materials,

Materials characterization and properties

© 2016 Ştefan Ţălu, Sebastian Stach, Shahoo Valedbagi, Reza Bavadi, S. Mohammad Elahi, Mihai Ţălu, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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